Time-Resolved Electron Energy Distributions and Plasma Characteristics in a Pulsed Capacitively Coupled Plasma

IEEE Transactions on Plasma Science ◽

10.1109/tps.2011.2132743 ◽

2011 ◽

Vol 39 (11) ◽

pp. 2542-2543 ◽

Author(s):

Sang-Heon Song ◽

Mark J. Kushner

Keyword(s):

Electron Energy ◽

Energy Distributions ◽

Time Resolved ◽

Capacitively Coupled ◽

Plasma Characteristics ◽

Capacitively Coupled Plasma

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Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF4/O2

Plasma Sources Science and Technology ◽

10.1088/0963-0252/21/5/055028 ◽

2012 ◽

Vol 21 (5) ◽

pp. 055028 ◽

Author(s):

Sang-Heon Song ◽

Mark J Kushner

Keyword(s):

Electron Energy ◽

Dual Frequency ◽

Energy Distributions ◽

Capacitively Coupled ◽

Plasma Characteristics ◽

Coupled Plasmas

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Effect of driving frequency on the electron energy distribution function and electron-sheath interaction in a low pressure capacitively coupled plasma

Physics of Plasmas ◽

10.1063/1.4967356 ◽

2016 ◽

Vol 23 (11) ◽

pp. 110701 ◽

Author(s):

S. Sharma ◽

N. Sirse ◽

P. K. Kaw ◽

M. M. Turner ◽

A. R. Ellingboe

Keyword(s):

Distribution Function ◽

Energy Distribution ◽

Electron Energy ◽

Electron Energy Distribution Function ◽

Low Pressure ◽

Energy Distribution Function ◽

Driving Frequency ◽

Electron Energy Distribution ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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The time-resolved two-dimensional profile of a radiofrequency capacitively coupled plasma

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/30/12/015 ◽

1997 ◽

Vol 30 (12) ◽

pp. 1783-1789 ◽

Author(s):

T Kitajima ◽

M Izawa ◽

N Nakano ◽

T Makabe

Keyword(s):

Two Dimensional ◽

Time Resolved ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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A Comparison of Ion Energy Distributions Calculated by Various Methods in Capacitively Coupled Plasma Discharge

Journal of the Korean Physical Society ◽

10.3938/jkps.55.1849 ◽

2009 ◽

Vol 55 (5(1)) ◽

pp. 1849-1854

Author(s):

Nam-Sik Yoon ◽

Deuk-Chul Kwon

Keyword(s):

Plasma Discharge ◽

Energy Distributions ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma ◽

Ion Energy Distributions

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Analysis of energy relaxation kinetics for control of the electron energy distributions in capacitively coupled RF discharges

Plasma Sources Science and Technology ◽

10.1088/1361-6595/aab862 ◽

2018 ◽

Vol 27 (4) ◽

pp. 04LT01 ◽

Author(s):

Jung Yeol Lee ◽

John P Verboncoeur ◽

Hae June Lee

Keyword(s):

Electron Energy ◽

Energy Relaxation ◽

Energy Distributions ◽

Relaxation Kinetics ◽

Capacitively Coupled ◽

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Electron energy distributions using the time‐resolved free‐bound spectra from coronal plasmas

Applied Physics Letters ◽

10.1063/1.94835 ◽

1984 ◽

Vol 44 (6) ◽

pp. 586-588 ◽

Author(s):

D. L. Matthews ◽

R. L. Kauffman ◽

J. D. Kilkenny ◽

R. W. Lee

Keyword(s):

Electron Energy ◽

Energy Distributions ◽

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Influence of the low-frequency source parameters on the plasma characteristics in a dual frequency capacitively coupled plasma reactor: Two dimensional simulations

Progress in Natural Science Materials International ◽

10.1016/j.pnsc.2008.08.010 ◽

2009 ◽

Vol 19 (6) ◽

pp. 677-684 ◽

Author(s):

Xiang Xu ◽

Hao Ge ◽

Shuai Wang ◽

Zhongling Dai ◽

Younian Wang ◽

...

Keyword(s):

Plasma Reactor ◽

Source Parameters ◽

Low Frequency ◽

Two Dimensional ◽

Dual Frequency ◽

Capacitively Coupled ◽

Frequency Source ◽

Plasma Characteristics ◽

Capacitively Coupled Plasma

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Modulating effects of the low-frequency source on ion energy distributions in a dual frequency capacitively coupled plasma

Applied Physics Letters ◽

10.1063/1.2945890 ◽

2008 ◽

Vol 93 (3) ◽

pp. 031504 ◽

Author(s):

Xiao-Song Li ◽

Zhen-Hua Bi ◽

Da-Lei Chang ◽

Zhi-Cheng Li ◽

Shuai Wang ◽

...

Keyword(s):

Low Frequency ◽

Dual Frequency ◽

Energy Distributions ◽

Capacitively Coupled ◽

Frequency Source ◽

Capacitively Coupled Plasma ◽

Ion Energy Distributions

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Hybrid simulation of electron energy distributions and plasma characteristics in pulsed RF CCP sustained in Ar and SiH4/Ar discharges

Physics of Plasmas ◽

10.1063/1.5009416 ◽

2017 ◽

Vol 24 (11) ◽

pp. 113503 ◽

Author(s):

Xi-Feng Wang ◽

Wen-Zhu Jia ◽

Yuan-Hong Song ◽

Ying-Ying Zhang ◽

Zhong-Ling Dai ◽

...

Keyword(s):

Electron Energy ◽

Hybrid Simulation ◽

Energy Distributions ◽

Plasma Characteristics ◽

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Comprehensive understanding of chamber conditioning effects on plasma characteristics in an advanced capacitively coupled plasma etcher

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4968206 ◽

2016 ◽

Vol 35 (2) ◽

pp. 021304 ◽

Author(s):

Kye Hyun Baek ◽

Eunwoo Lee ◽

Michael Klick ◽

Ralf Rothe

Keyword(s):

Comprehensive Understanding ◽

Capacitively Coupled ◽

Plasma Characteristics ◽

Capacitively Coupled Plasma

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