Tribology and Electrochemical Corrosion Properties of TiC Thin Film Coatings Grown by RF Magnetron Sputtering

2021 ◽  
Author(s):  
Olayinka Abegunde ◽  
Esther Akinlabi ◽  
Philip Oladijo
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Electrochemical Corrosion ◽  
Rf Magnetron Sputtering ◽  
Corrosion Properties ◽  
Film Coatings ◽  
Thin Film Coatings

Deposition and Characterization of Aluminium Thin film Coatings using DC Magnetron Sputtering Process

2018 ◽  
Vol 5 (1) ◽  
pp. 2696-2704 ◽  
Author(s):  
M. Muralidhar Singh ◽  
G. Vijaya ◽  
M.S. Krupashankara ◽  
B.K. Sridhara ◽  
T.N. Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

scholarly journals Studies on Nanostructure Aluminium Thin Film Coatings Deposited using DC magnetron Sputtering Process

2016 ◽  
Vol 149 ◽  
pp. 012071 ◽  
Author(s):  
Muralidhar Singh M ◽  
Vijaya G ◽  
Krupashankara MS ◽  
B K Sridhara ◽  
T N Shridhar
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Film Coatings ◽  
Thin Film Coatings

Deposition of Al65Cu23Fe12 and Composite Quasicrystalline Pvd Thin Film Coatings

2000 ◽  
Vol 643 ◽  
Author(s):  
Daniel J. Sordelet ◽  
Matthew F. Besser ◽  
Frank M. Kustus
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Composite Coatings ◽  
Icosahedral Phase ◽  
Arc Spraying ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Target Composition ◽  
Cu Substrates

AbstractThin film coatings of Al-based quasicrystals were deposited by magnetron sputtering. Sputtering targets of Al65Cu23Fe12 and Al65Cu23Fe12+5v/o Fe-Al were prepared with plasma arc spraying by forming thick (∼5mm) coatings onto Cu substrates. By incorporating a controlled fraction of porosity and micro-cracks within the plasma sprayed target, cracking or delamination of the target during magnetron sputtering could be avoided. Compositions of the as-deposited PVD films were close to the sputtering target composition when the bias voltage was kept around –40V; higher bias voltages (e.g., -100 to -200V) lead to coatings that were deficient in Al. As-deposited coatings prepared with the lower bias voltage could be subsequently annealed at 700°C for two hours to yield a nearly single-phase icosahedral structure. After annealing, composite coatings indicate the presence of an Fe-Al phase along with the icosahedral phase.

Tribology and Electrochemical Corrosion Properties of TiC Thin Film Coatings Grown by RF Magnetron Sputtering

2020 ◽  
Author(s):  
Abegunde Olayinka ◽  
Akinlabi Esther ◽  
Oladijo Philip
Keyword(s):  
Magnetron Sputtering ◽  
Titanium Alloys ◽  
Process Parameters ◽  
Electrochemical Corrosion ◽  
Wear Test ◽  
Rf Magnetron Sputtering ◽  
Deposition Process ◽  
Limiting Factor ◽  
Corrosion Properties ◽  
Wear And Corrosion

Abstract Titanium alloys have found application in many sectors and are regarded as one of the most valuable materials of the 21st century. Although titanium alloys have many promising properties, the tribo-corrosion properties still happen to be a limiting factor. In this research study, radio frequency (RF) magnetron sputtering was used to deposit refractory ceramic (TiC) thin films coatings on the surface of titanium alloys in order to enhance and improve the wear and corrosion resistance properties. Different combinations of the sputtering process parameters were used for the deposition process. The varied sputtering process parameters were RF Power, sputtering time, and temperature. The macroscratch, microscratch (adhesion test) and, corrosion properties of the coatings were investigated using the pin on-disk wear test, micro-scratch tribometer, and electrochemical potentiostat, respectively. The results show improvement in the wear and corrosion properties of the coated samples. The results also revealed the influence of the sputtering process parameters on the evolving wear and corrosion properties of the coated samples. Scanning electron microscope (SEM) was used to capture the wear scar and analyses the failure mode of the coatings.

scholarly journals TG/DTA studies on the oxidation and thermal behaviour of Ti-6Al-4V-B4C coatings obtained by magnetron sputtering

2020 ◽  
Vol 18 (3) ◽  
Author(s):  
R. Malkiya Rasalin Prince ◽  
N. Selvakumar ◽  
D. Arulkirubakaran ◽  
S. Christopher Ezhil Singh ◽  
M. Chrispin Das ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Thermal Behaviour ◽  
Exothermic Peak ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Composition And Structure ◽  
Dta Studies ◽  
Boron Carbide B4c

Thermogravimetric analysis (TG) is a rapid method for the determination of protecting the ability of thin film coatings in addition to oxidation kinetics. Boron carbide (B4C) reinforced Ti-6Al-4V thin films were deposited through the magnetron sputtering coating technique. The effect of 0, 2, 4, 6 and 8 Wt. % of B4C adding on microstructure, thermal behaviour and hardness of Ti-6Al-4V-B4C coatings were investigated. Thermal analysis of Ti-6Al-4V-B4C coatings with varying percentage of B4C resulted in the establishment of an exothermic peak, for the reason that reduction in the oxidation of coating. The thermal behaviour of coating was improved by B 4C addition; those coatings are recommended for practical application. It was proven that the addition of B 4C not only alters the thermal stability but also transforms the mechanism of oxidation. It was absolutely unconcealed that the Ti-6Al-4V-B4C film oxidization may be a multi-staged procedure subject on the heating rate. An occurrence of formal treatment for obtaining Kissinger’s assessment mechanics for various oxidization levels is additionally valid. The addition of B4C was supported to enhance the nanohardness of the coating. The morphology, composition and structure of the thin film coatings were examined by way of SEM, AFM and XRD.

Sign in / Sign up

Export Citation Format

Share Document