Plasma etching endpoint detection using multiple wavelengths for small open-area wafers
2001 ◽
Vol 19
(1)
◽
pp. 66-75
◽
1985 ◽
Vol 3
(3)
◽
pp. 631-636
◽
1984 ◽
Vol 5
(12)
◽
pp. 514-517
◽
2014 ◽
Vol 4
(7)
◽
pp. 1251-1260
◽
Keyword(s):
2007 ◽
Keyword(s):