Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1339019 ◽

2001 ◽

Vol 19 (2) ◽

pp. 414-419 ◽

Author(s):

N. Malkomes ◽

M. Vergöhl ◽

B. Szyszka

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

High Rate ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering

Coatings on Glass 1998 ◽

10.1016/b978-044450247-6.50050-3 ◽

1999 ◽

pp. 249-254

Author(s):

B. Szyszka

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering

Thin Solid Films ◽

10.1016/s0040-6090(99)00158-3 ◽

1999 ◽

Vol 351 (1-2) ◽

pp. 164-169 ◽

Author(s):

B. Szyszka

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Reactive magnetron sputtering of transparent and conductive zinc oxide films deposited at high rates onto CIS/CIGS photovoltaic devices

Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997 ◽

10.1109/pvsc.1997.654134 ◽

2002 ◽

Author(s):

T.J. Gillespie ◽

W.A. Miles ◽

J.A. del Cueto

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Photovoltaic Devices ◽

Zinc Oxide Films

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Preparation and properties of nitrogen doped p-type zinc oxide films by reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2013.10.001 ◽

2014 ◽

Vol 101 ◽

pp. 313-316 ◽

Author(s):

ZhanWu Wang ◽

Yonggao Yue ◽

Yan Cao

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Nitrogen Doped ◽

Zinc Oxide Films ◽

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Comparable study on the effect of diluted NH4Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2009.03.080 ◽

2009 ◽

Vol 255 (16) ◽

pp. 7268-7272 ◽

Author(s):

Xiaoyong Gao ◽

Qinggeng Lin ◽

Hongliang Feng ◽

Yongsheng Chen ◽

Shie Yang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Current Pulse ◽

Direct Current ◽

Surface Texture ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide ◽

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Study on the structural, electrical, and optical properties of aluminum-doped zinc oxide films by direct current pulse reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.02.133 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4684-4688 ◽

Author(s):

Gao Xiao-Yong ◽

Lin Qing-Geng ◽

Feng Hong-Liang ◽

Liu Yu-Fen ◽

Lu Jing-Xiao

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Current Pulse ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Zinc oxide films prepared by dc reactive magnetron sputtering at different substrate temperatures

Vacuum ◽

10.1016/0042-207x(94)90334-4 ◽

1994 ◽

Vol 45 (1) ◽

pp. 19-22 ◽

Author(s):

Li-Jian Meng ◽

M Andritschky ◽

MP dos Santos

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Dc Reactive Magnetron Sputtering ◽

Substrate Temperatures

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Optical and electrical properties of doped zinc oxide films prepared by ac reactive magnetron sputtering

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(97)00288-3 ◽

1997 ◽

Vol 218 ◽

pp. 74-80 ◽

Author(s):

B. Szyszka ◽

S. Jäger

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Optical And Electrical Properties ◽

Reactive Magnetron ◽

Zinc Oxide Films

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Voltage-controlled DC reactive magnetron sputtering of indium-doped zinc oxide films

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/25/5/019 ◽

1992 ◽

Vol 25 (5) ◽

pp. 865-870 ◽

Author(s):

H Czternastek ◽

A Brudnik ◽

M Jachimowski ◽

E Kolawa

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Dc Reactive Magnetron Sputtering

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Physical Properties of Zinc Oxide Films Prepared by dc Reactive Magnetron Sputtering at Different Sputtering Pressures

Crystal Research and Technology ◽

10.1002/1521-4079(200010)35:10<1193::aid-crat1193>3.0.co;2-6 ◽

2000 ◽

Vol 35 (10) ◽

pp. 1193-1202 ◽

Author(s):

T.K. Subramanyam ◽

B. Srinivasulu Naidu ◽

S. Uthanna

Keyword(s):

Magnetron Sputtering ◽

Physical Properties ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Dc Reactive Magnetron Sputtering

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