Molecular beam epitaxial growth and characterization of strain-compensated Al[sub 0.3]In[sub 0.7]P/InP/Al[sub 0.3]In[sub 0.7]P metamorphic–pseudomorphic high electron mobility transistors on GaAs substrates

Author(s):  
W. E. Hoke ◽  
P. J. Lemonias ◽  
T. D. Kennedy ◽  
A. Torabi ◽  
E. K. Tong ◽  
...  
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