Steady-state direct-current plasma immersion ion implantation using a multipolar magnetic field electron cyclotron resonance plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1412653 ◽

2001 ◽

Vol 19 (6) ◽

pp. 2889 ◽

Author(s):

Xuchu Zeng ◽

Honghui Tong ◽

Ricky King-Yu Fu ◽

Paul K. Chu ◽

Zejin Xu ◽

...

Keyword(s):

Magnetic Field ◽

Steady State ◽

Ion Implantation ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Direct Current Plasma ◽

Plasma Immersion Ion Implantation ◽

Resonance Plasma

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Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source

Thin Solid Films ◽

10.1016/s0040-6090(01)00950-6 ◽

2001 ◽

Vol 390 (1-2) ◽

pp. 145-148 ◽

Author(s):

Xuchu Zeng ◽

Paul K Chu ◽

Qingchuan Chen ◽

Honghui Tong

Keyword(s):

Steady State ◽

Ion Implantation ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Direct Current Plasma ◽

Plasma Immersion Ion Implantation ◽

Resonance Plasma

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Structure and tribology properties of diamond-like carbon films prepared by microwave electron cyclotron resonance plasma source ion implantation

Acta Physica Sinica ◽

10.7498/aps.54.3241 ◽

2005 ◽

Vol 54 (7) ◽

pp. 3241

Author(s):

Gao Peng ◽

Xu Jun ◽

Deng Xin-Lu ◽

Wang De-He ◽

Dong Chuang

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Carbon Films ◽

Electron Cyclotron ◽

Diamond Like Carbon ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Source Ion Implantation ◽

Resonance Plasma

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Nitrogen and oxygen ion implantation of aluminum using an electron cyclotron resonance plasma source

10.1117/12.321947 ◽

1998 ◽

Author(s):

Dan Popovici ◽

Bernard Terreault ◽

Andranik H. Sarkissian ◽

R. W. Paynter ◽

Guy G. Ross ◽

...

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Oxygen Ion Implantation ◽

Resonance Plasma

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Electron cyclotron resonance plasma source in a flaring magnetic field

Plasma Sources Science and Technology ◽

10.1088/0963-0252/3/2/001 ◽

1994 ◽

Vol 3 (2) ◽

pp. 123-127 ◽

Author(s):

X Caron ◽

R L Meyer ◽

C Meis

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Design and characterization of 2.45 GHz electron cyclotron resonance plasma source with magnetron magnetic field configuration for high flux of hyperthermal neutral beam

Review of Scientific Instruments ◽

10.1063/1.3477998 ◽

2010 ◽

Vol 81 (8) ◽

pp. 083301 ◽

Author(s):

Seong Bong Kim ◽

Dae Chul Kim ◽

Won Namkung ◽

Moohyun Cho ◽

Suk Jae Yoo

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Field Configuration ◽

Neutral Beam ◽

High Flux ◽

Magnetic Field Configuration ◽

Resonance Plasma

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11–13GHz electron cyclotron resonance plasma source using cylindrically comb-shaped magnetic-field configuration for broad ion-beam processing

Review of Scientific Instruments ◽

10.1063/1.2387885 ◽

2006 ◽

Vol 77 (11) ◽

pp. 113503 ◽

Author(s):

Toyohisa Asaji ◽

Yushi Kato ◽

Fuminobu Sato ◽

Toshiyuki Iida ◽

Junji Saito

Keyword(s):

Magnetic Field ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Ion Beam ◽

Plasma Source ◽

Field Configuration ◽

Electron Cyclotron ◽

Magnetic Field Configuration ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Steady state direct current plasma immersion ion implantation (PIII) using a grounded conducting grid

ICOPS 2000. IEEE Conference Record - Abstracts. 27th IEEE International Conference on Plasma Science (Cat. No.00CH37087) ◽

10.1109/plasma.2000.854554 ◽

2002 ◽

Author(s):

D.T.K. Kwok ◽

X. Zeng ◽

C. Chan ◽

P.K. Chu

Keyword(s):

Steady State ◽

Ion Implantation ◽

Direct Current ◽

Direct Current Plasma ◽

Plasma Immersion Ion Implantation

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Synthesis of a-C thin films by plasma-based ion implantation using an electron cyclotron resonance plasma source with a mirror field

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00036-7 ◽

2003 ◽

Vol 169-170 ◽

pp. 266-269

Author(s):

Toshiya Watanabe ◽

Kazuhiro Yamamoto ◽

Osamu Tsuda ◽

Yoshinori Koga ◽

Akihiro Tanaka

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Development of Plasma Based Ion Implantation System using an Electron Cyclotron Resonance Plasma Source with a Mirror Field and Synthesis of Carbon Thin Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.40.4684 ◽

2001 ◽

Vol 40 (Part 1, No. 7) ◽

pp. 4684-4690 ◽

Author(s):

Toshiya Watanabe ◽

Kazuhiro Yamamoto ◽

Yoshinori Koga ◽

Akihiro Tanaka

Keyword(s):

Ion Implantation ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Carbon Thin Films ◽

Resonance Plasma

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Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1340654 ◽

2001 ◽

Vol 19 (2) ◽

pp. 425-428 ◽

Author(s):

Xu Jun ◽

Deng Xinlu ◽

Yu Shiji ◽

Lu Wenqi ◽

Ma Tengcai

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Planar Magnetron ◽

Resonance Plasma

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