Steady state direct current plasma immersion ion implantation (PIII) using a grounded conducting grid
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2001 ◽
Vol 19
(6)
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pp. 2889
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2001 ◽
Vol 390
(1-2)
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pp. 145-148
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2003 ◽
Vol 31
(3)
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pp. 356-361
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2003 ◽
Vol 21
(5)
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pp. 2109
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2010 ◽
Vol 43
(9)
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pp. 095203
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2013 ◽
Vol 229
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pp. 2-11
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