Relation between spatial resolution and reaction mechanism of chemically amplified resists for electron beam lithography

2003 ◽  
Vol 21 (6) ◽  
pp. 3149 ◽  
Author(s):  
Takahiro Kozawa ◽  
Akinori Saeki ◽  
Atsuro Nakano ◽  
Yoichi Yoshida ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
Reaction Mechanism ◽  
Spatial Resolution ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6761-6766 ◽  
Author(s):  
Young-Mog Ham ◽  
Ki-Ho Baik ◽  
Won-Gyu Lee ◽  
Tack Dong Chung ◽  
Kukjin Chun
Keyword(s):  
Electron Beam ◽  
Empirical Model ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Protonation Sites in Chemically Amplified Resists for Electron-Beam Lithography

2006 ◽  
Vol 45 (No. 47) ◽  
pp. L1256-L1258 ◽  
Author(s):  
Kenichiro Natsuda ◽  
Takahiro Kozawa ◽  
Kazumasa Okamoto ◽  
Seiichi Tagawa
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Silylation and Dry Development of Chemically Amplified Resists SAL601*, AZPN114*1, and Epoxidised Resist (EPR*1) for High Resolution Electron-Beam Lithography

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6873-6876 ◽  
Author(s):  
Evangelia Tegou ◽  
Evangelos Gogolides ◽  
Panagiotis Argitis ◽  
Ioannis Raptis ◽  
Giancarlo Meneghini ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Resolution Electron ◽  
Chemically Amplified Resists
Sign in / Sign up

Export Citation Format

Share Document