Theoretical study on protected unit fluctuation of chemically amplified resists used for photomask production by electron beam lithography

2020 ◽  
Vol 59 (1) ◽  
pp. 016503
Author(s):  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Theoretical Study ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6761-6766 ◽  
Author(s):  
Young-Mog Ham ◽  
Ki-Ho Baik ◽  
Won-Gyu Lee ◽  
Tack Dong Chung ◽  
Kukjin Chun
Keyword(s):  
Electron Beam ◽  
Empirical Model ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resists
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