Electrical properties of indium-tin oxide films deposited on nonheated substrates using a planar-magnetron sputtering system and a facing-targets sputtering system

2006 ◽  
Vol 24 (1) ◽  
pp. 65-69 ◽  
Author(s):  
Hideo Iwase ◽  
Youichi Hoshi ◽  
Makoto Kameyama
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Planar Magnetron ◽  
Tin Oxide Films ◽  
Sputtering System

Microstructure and Electrical Properties of Yb- or Sm-Doped Indium–Tin-Oxide Films Prepared by DC Magnetron Sputtering

2009 ◽  
Vol 48 (5) ◽  
pp. 05EC04 ◽  
Author(s):  
Sung Ryong Choi ◽  
Sang Hyun Cho ◽  
Se Il Kim ◽  
Yong Min Kang ◽  
Han Ho Yoon ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films

Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films
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