Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita

1995 ◽  
Vol 257 (1) ◽  
pp. 32-35 ◽  
Author(s):  
R.N. Joshi ◽  
V.P. Singh ◽  
J.C. McClure

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