Two stage ion beam figuring and smoothening method for shape error correction of ULE® substrates of extreme ultraviolet lithography projection optics: Evaluation of high-spatial frequency roughness

2009 ◽  
Vol 27 (6) ◽  
pp. 2900 ◽  
Author(s):  
Kazuma Kamijo ◽  
Ryou Uozumi ◽  
Kenta Moriziri ◽  
S. A. Pahlovy ◽  
Iwao Miyamoto
Keyword(s):  
Spatial Frequency ◽  
Error Correction ◽  
Extreme Ultraviolet ◽  
Ion Beam ◽  
High Spatial Frequency ◽  
Shape Error ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Ion Beam Figuring ◽  
Projection Optics

Advance in the Fabrication of Ordered Ge/Si Nanostructure Array on Si Patterned Substrate by Nanosphere Lithography

2016 ◽  
Vol 852 ◽  
pp. 283-292
Author(s):  
Zheng Hang Xin ◽  
Chong Wang ◽  
Feng Qiu ◽  
Rong Fei Wang ◽  
Chen Li ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ion Beam ◽  
Nanosphere Lithography ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Patterned Substrate ◽  
Hexagonal Close Packed ◽  
Potential Applications ◽  
Focus Ion Beam ◽  
Si Quantum Dots

The recent process in the fabrication of the ordered Ge/Si quantum dots (QDs) is reviewed. The fabrication step generally started on the preparation of patterned substrate prepared in advance by using several interesting methods, such as photo lithography, focus ion beam (FIB), reactive ion etching (RIE), and extreme ultraviolet lithography (EUV-IL) et al, which are introduced briefly in this article. Here, we’d like to focus on the detailed process of nanosphere lithography (NSL) which has the advantages of less cost and higher product compared with the referred methods. The ordered Ge nanostructures always show as Hexagonal close-packed array on the patterned Si substrate and have the advantages of potential applications in electronic and optoelectronic devices.

Inhibition of Contamination of Ru-Capped Multilayer Mirrors for Extreme Ultraviolet Lithography Projection Optics by Ethanol

2007 ◽  
Vol 46 (9B) ◽  
pp. 6155-6160 ◽  
Author(s):  
Yukinobu Kakutani ◽  
Masahito Niibe ◽  
Yoshio Gomei ◽  
Hiromitsu Takase ◽  
Shigeru Terashima ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Multilayer Mirrors ◽  
Ultraviolet Lithography ◽  
Projection Optics

Multilayer coating of 10X projection optics for extreme ultraviolet lithography

1999 ◽  
Author(s):  
Claude Montcalm ◽  
Eberhard A. Spiller ◽  
Marco Wedowski ◽  
Eric M. Gullikson ◽  
James A. Folta
Keyword(s):  
Extreme Ultraviolet ◽  
Multilayer Coating ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Projection Optics
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