Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
2018 ◽
Vol 36
(5)
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pp. 051505
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2003 ◽
Vol 42
(Part 2, No. 4B)
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pp. L414-L416
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Keyword(s):
2018 ◽
Vol 18
(12)
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pp. 8333-8336
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Keyword(s):
2017 ◽
Vol 29
(15)
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pp. 6502-6510
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2006 ◽
Vol 9
(3)
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pp. C54
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Keyword(s):
2014 ◽
Vol 19
(2)
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pp. 144-149
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2003 ◽
Vol 42
(Part 1, No. 7A)
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pp. 4245-4248
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Keyword(s):
2018 ◽
Vol 36
(4)
◽
pp. 041501
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Keyword(s):