Transient behavior in quasi-atomic layer etching of silicon dioxide and silicon nitride in fluorocarbon plasmas
2018 ◽
Vol 36
(6)
◽
pp. 06B101
◽
Keyword(s):
2020 ◽
Vol 38
(4)
◽
pp. 043007
2021 ◽
Vol 39
(3)
◽
pp. 033003
Keyword(s):
2017 ◽
Vol 56
(6S2)
◽
pp. 06HB07
◽
2017 ◽
Vol 35
(1)
◽
pp. 01A102
◽
2019 ◽
Vol 11
(40)
◽
pp. 37263-37269
◽
Keyword(s):
2017 ◽
Vol 56
(6S2)
◽
pp. 06HB01
◽