In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals

2019 ◽  
Vol 11 (40) ◽  
pp. 37263-37269 ◽  
Author(s):  
Kazuya Nakane ◽  
René H. J. Vervuurt ◽  
Takayoshi Tsutsumi ◽  
Nobuyoshi Kobayashi ◽  
Masaru Hori
Keyword(s):  
Silicon Nitride ◽  
Hydrogen Plasma ◽  
Surface Reactions ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Atomic Layer Etching

In Situ Monitoring of Atomic Layer Controlled Pore Reduction in Alumina Tubular Membranes Using Sequential Surface Reactions

1998 ◽  
Vol 10 (12) ◽  
pp. 3941-3950 ◽  
Author(s):  
B. S. Berland ◽  
I. P. Gartland ◽  
A. W. Ott ◽  
S. M. George
Keyword(s):  
Surface Reactions ◽  
Atomic Layer ◽  
In Situ Monitoring ◽  
Tubular Membranes

In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications

2020 ◽  
Vol 12 (14) ◽  
pp. 16639-16647 ◽  
Author(s):  
Alexander C. Kozen ◽  
Zachary R. Robinson ◽  
Evan R. Glaser ◽  
Mark Twigg ◽  
Thomas J. Larrabee ◽  
...  
Keyword(s):  
Niobium Oxide ◽  
Hydrogen Plasma ◽  
Oxide Films ◽  
Atomic Layer ◽  
Plasma Exposure ◽  
Neuromorphic Computing

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Role of physisorption in atomic layer etching of silicon nitride

2020 ◽  
Vol 38 (4) ◽  
pp. 043007
Author(s):  
Shyam Sridhar ◽  
Peter L. G. Ventzek ◽  
Alok Ranjan
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer ◽  
Atomic Layer Etching
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