Microspot elementary and chemical analyses using combined high energy resolution Auger electron spectroscopy and x‐ray photoelectron spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.572952 ◽

1985 ◽

Vol 3 (5) ◽

pp. 1965-1968 ◽

Author(s):

P. Staib ◽

J. P. Contour ◽

J. Massies

Keyword(s):

Auger Electron Spectroscopy ◽

Energy Resolution ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

High Energy ◽

High Energy Resolution ◽

Chemical Analyses ◽

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Quantitative determination of titanium nitride films by high energy resolution Auger electron spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579478 ◽

1995 ◽

Vol 13 (5) ◽

pp. 2384-2389 ◽

Author(s):

Qing Yu Zhang

Keyword(s):

Quantitative Determination ◽

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Energy Resolution ◽

Electron Spectroscopy ◽

Auger Electron ◽

High Energy ◽

High Energy Resolution

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A method for rapid collection of high‐energy‐resolution Auger electron spectroscopy data: The digital‐derivative‐generation technique

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575024 ◽

1988 ◽

Vol 6 (4) ◽

pp. 2280-2286 ◽

Author(s):

Richard E. Gilbert ◽

Gar B. Hoflund ◽

Douglas A. Asbury ◽

Mark R. Davidson

Keyword(s):

Auger Electron Spectroscopy ◽

Energy Resolution ◽

Electron Spectroscopy ◽

Auger Electron ◽

High Energy ◽

High Energy Resolution ◽

Spectroscopy Data ◽

Generation Technique ◽

Auger Electron Spectroscopy Data

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Summary Abstract: High energy resolution Auger electron spectroscopy of Ti and TiN

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574772 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1371-1372 ◽

Author(s):

F. Pellerin ◽

C. Bodin ◽

T. Pech

Keyword(s):

Auger Electron Spectroscopy ◽

Energy Resolution ◽

Electron Spectroscopy ◽

Auger Electron ◽

High Energy ◽

High Energy Resolution

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results

10.3403/30242215 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Study of amorphous and crystallised Fe75B25 by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science ◽

10.1016/0169-4332(91)90396-2 ◽

1991 ◽

Vol 51 (3-4) ◽

pp. 139-155 ◽

Author(s):

S.K. Sharma ◽

S. Hofmann

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

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International Standardization of Quantitative Surface Analysis by Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy

Shinku ◽

10.3131/jvsj.48.261 ◽

2005 ◽

Vol 48 (4) ◽

pp. 261-264

Author(s):

Shigeo TANUMA

Keyword(s):

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Quantitative Surface Analysis ◽

International Standardization

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Summary of ISO/TC 201 Standard: XXIX. ISO 20903: 2006—Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—methods used to determine peak intensities and information required when reporting results

Surface and Interface Analysis ◽

10.1002/sia.2533 ◽

2007 ◽

Vol 39 (5) ◽

pp. 464-466 ◽

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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A correlation of Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and Rutherford backscattering spectrometry measurements on sputter‐deposited titanium nitride thin films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574092 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2463-2469 ◽

Author(s):

Brad J. Burrow ◽

Alan E. Morgan ◽

Russell C. Ellwanger

Keyword(s):

Titanium Nitride ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

X Ray ◽

Sputter Deposited

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Initial adsorption kinetics of oxygen on a Cu0.82Li0.18 alloy surface studied by combined Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and time‐of‐flight spectrometry of direct recoils

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574817 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1136-1141 ◽

Author(s):

M. H. Mintz ◽

U. Atzmony ◽

J. A. Schultz ◽

N. Shamir

Keyword(s):

Auger Electron Spectroscopy ◽

Adsorption Kinetics ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Time Of Flight ◽

Alloy Surface ◽

X Ray ◽

Initial Adsorption ◽

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