Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576242 ◽

1989 ◽

Vol 7 (3) ◽

pp. 1136-1144 ◽

Author(s):

G. Lucovsky ◽

J. T. Fitch ◽

D. V. Tsu ◽

S. S. Kim

Keyword(s):

Chemical Vapor Deposition ◽

Atomic Structure ◽

Vapor Deposition ◽

Chemical Vapor ◽

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Local atomic structure in thin films of silicon nitride and silicon diimide produced by remote plasma-enhanced chemical-vapor deposition

Physical Review B ◽

10.1103/physrevb.33.7069 ◽

1986 ◽

Vol 33 (10) ◽

pp. 7069-7076 ◽

Author(s):

D. V. Tsu ◽

G. Lucovsky ◽

M. J. Mantini

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Atomic Structure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Local Atomic Structure ◽

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Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition

Vacuum ◽

10.1016/0042-207x(89)90815-4 ◽

1989 ◽

Vol 39 (10) ◽

pp. 981

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Author(s):

M. Hernández Vélez

Keyword(s):

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Deposition of SiO2 Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface ◽

10.1007/978-1-4899-0774-5_13 ◽

1988 ◽

pp. 119-127 ◽

Author(s):

D. V. Tsu ◽

S. S. Kim ◽

G. Lucovsky

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

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Composition, structural, and electrical properties of fluorinated silicon–nitride thin films grown by remote plasma-enhanced chemical-vapor deposition from SiF[sub 4]/NH[sub 3] mixtures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1699335 ◽

2004 ◽

Vol 22 (3) ◽

pp. 570 ◽

Author(s):

J. Fandiño ◽

A. Ortiz ◽

L. Rodrı́guez-Fernandez ◽

J. C. Alonso

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Structural And Electrical Properties

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ChemInform Abstract: Preparation of Device-Quality SiO2 Thin Films by Remote Plasma- Enhanced Chemical Vapor Deposition (PECVD): Applications in Metal- Oxide-Semiconductor (MOS) Devices

10.1002/chin.199636322 ◽

2010 ◽

Vol 27 (36) ◽

pp. no-no

Author(s):

G. LUCOVSKY

Keyword(s):

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Remote Plasma ◽

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Barrier‐limited transport in μc‐Si and μc‐Si,C thin films prepared by remote plasma‐enhanced chemical‐vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578019 ◽

1992 ◽

Vol 10 (4) ◽

pp. 2025-2031 ◽

Author(s):

G. Lucovsky ◽

C. Wang ◽

Y. L. Chen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

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Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574902 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1998-2002 ◽

Author(s):

D. V. Tsu ◽

G. Lucovsky ◽

M. J. Mantini ◽

S. S. Chao

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

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The structures of low dielectric constant SiOC thin films prepared by direct and remote plasma enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2006.10.095 ◽

2007 ◽

Vol 515 (12) ◽

pp. 5035-5039 ◽

Author(s):

Jaeyeong Heo ◽

Hyeong Joon Kim ◽

JeongHoon Han ◽

Jong-Won Shon

Keyword(s):

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Dielectric Constant ◽

Remote Plasma ◽

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Deposition of silicon oxide, nitride and oxynitride thin films by remote plasma enhanced chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(87)80424-6 ◽

1987 ◽

Vol 90 (1-3) ◽

pp. 259-266 ◽

Author(s):

Gerald Lucovsky ◽

David V. Tsu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Oxide ◽

Chemical Vapor ◽

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