Low-temperature growth of Ti(C,N) thin films on D2 steel and Si(100) substrates by plasma-enhanced metalorganic chemical vapor deposition

2000 ◽  
Vol 18 (4) ◽  
pp. 1590-1594 ◽  
Author(s):  
Jin-Hyo Boo ◽  
Cheol Ho Heo ◽  
Yong Ki Cho ◽  
Jeon-Geon Han
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
D2 Steel ◽  
Metalorganic Chemical

Low-temperature growth and characterization of epitaxial ZnO nanorods by metalorganic chemical vapor deposition

2007 ◽  
Vol 22 (7) ◽  
pp. 2032-2036 ◽  
Author(s):  
Dong Chan Kim ◽  
Bo Hyun Kong ◽  
Sung-Yun Jeon ◽  
Ji-Beom Yoo ◽  
Hyung Koun Cho ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Large Scale ◽  
Metalorganic Chemical Vapor Deposition ◽  
Zno Nanorods ◽  
Chemical Vapor ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Metalorganic Chemical

By injecting additional argon gas, we were able to grow one-dimensional ZnO nanorod arrays with a uniform distribution on a large scale at a low temperature of less than 330 °C by metalorganic chemical vapor deposition. All of the nanorods grown on the sapphire substrate had a 30° in-plane rotation with respect to the substrate and showed the epitaxial characteristics of [10¯10]ZnO//[11¯20]sapphire, despite the low-temperature growth. These ZnO nanorods with high crystalline quality exhibited a high enhancement factor and low turn-on field value, thus having good potential to be used as a field emitter.

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