Thin film structure to reduce radiation damage in x-ray lithography

Author(s):  
J. R. Maldonado
2014 ◽  
Vol 83 (12) ◽  
Author(s):  
M A Shcherbina ◽  
S N Chvalun ◽  
Sergey Anatol'evich Ponomarenko ◽  
Mikhail Valentinovich Kovalchuk

2004 ◽  
Vol 146 (3) ◽  
pp. 243-250 ◽  
Author(s):  
P. Ostoja ◽  
P. Maccagnani ◽  
M. Gazzano ◽  
M. Cavallini ◽  
J.C. Kengne ◽  
...  

2019 ◽  
Vol 9 (02) ◽  
pp. 586-592 ◽  
Author(s):  
Shuai Liu ◽  
Charles N. Melton ◽  
Singanallur Venkatakrishnan ◽  
Ronald J. Pandolfi ◽  
Guillaume Freychet ◽  
...  

Abstract


2019 ◽  
Vol 127 (12) ◽  
pp. 986
Author(s):  
Л.В. Григорьев ◽  
Я.Б. Егорова ◽  
Н.А. Быков ◽  
А.А. Семенов ◽  
А.А. Никитин

The results of a study of the structural, optical, and photoluminescent properties of the thin-film structure ZnO/ferroelectric ceramics PLZT are presented. The results of X-ray diffraction analysis of a zinc oxide film synthesized on a PLZT substrate and on a quartz substrate are presented. The transmission spectra, reflection spectra, absorption spectra, and spectral dependence of the photoluminescence of the thin-film structure of ZnO- PLZT and the structure of ZnO-SiO2 in the ultraviolet and visible spectral ranges are presented.


Author(s):  
N. V. Vishnyakov ◽  
◽  
N. M. Tolkach ◽  
P. S. Provotorov ◽  
◽  
...  

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