EUV line-space pattern defect mitigation simulation using Coventor SEMulator3D to enable exposure dose reduction

2019 ◽  
Author(s):  
Daniel Sobieski ◽  
Rich Wise ◽  
Yang Pan ◽  
David Fried ◽  
Jengyi Yu ◽  
...  
Keyword(s):  
Dose Reduction ◽  
Exposure Dose ◽  
Space Pattern ◽  
Line Space

Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch

2015 ◽  
Author(s):  
HsinYu Tsai ◽  
Hiroyuki Miyazoe ◽  
Joy Cheng ◽  
Markus Brink ◽  
Simon Dawes ◽  
...  
Keyword(s):  
Self Assembly ◽  
Space Pattern ◽  
Line Space

Scattering Ray and Exposure Dose Reduction by Using Metal Sheet in X-ray Imaging System

2021 ◽  
Vol 58 (6) ◽  
pp. 89-96
Author(s):  
Ho-Il Lee ◽  
Seok-Hwan Bae ◽  
Yeun-Chul Ryu ◽  
Young-Joon Park ◽  
Yong-Gwon Kim
Keyword(s):  
Dose Reduction ◽  
Imaging System ◽  
Exposure Dose ◽  
Metal Sheet ◽  
X Ray ◽  
X Ray Imaging

scholarly journals Impact of Exposure Dose Reduction of Radiation Treatment Planning CT Using Low Tube Voltage Technique

2015 ◽  
Vol 71 (4) ◽  
pp. 308-315 ◽  
Author(s):  
Takuya Kouno ◽  
Noriyuki Kuga ◽  
Masahiro Enzaki ◽  
Yuuki Yamashita ◽  
Yumiko Kitazato ◽  
...  
Keyword(s):  
Dose Reduction ◽  
Treatment Planning ◽  
Radiation Treatment ◽  
Exposure Dose ◽  
Radiation Treatment Planning ◽  
Tube Voltage ◽  
Low Tube Voltage ◽  
Planning Ct

28 nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy Directed Self-Assembly (DSA) process flow

2014 ◽  
Vol 123 ◽  
pp. 180-186 ◽  
Author(s):  
Boon Teik Chan ◽  
Shigeru Tahara ◽  
Doni Parnell ◽  
Paulina A. Rincon Delgadillo ◽  
Roel Gronheid ◽  
...  
Keyword(s):  
Self Assembly ◽  
Pattern Transfer ◽  
Silicon Substrates ◽  
Process Flow ◽  
Space Pattern ◽  
Line Space ◽  
28 Nm
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