Residual stress analysis of anodic aluminum oxide thin films for infrared emitter device application.

2019 ◽  
Author(s):  
Young Bong Shin ◽  
Hee Chul Lee
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Aluminum Oxide ◽  
Stress Analysis ◽  
Anodic Aluminum Oxide ◽  
Oxide Thin Films ◽  
Device Application ◽  
Anodic Aluminum ◽  
Infrared Emitter ◽  
Residual Stress Analysis

scholarly journals Structures and Optical Properties of Anodic Aluminum Oxide Thin Films

2015 ◽  
Vol 1 (1) ◽  
pp. 69-77 ◽  
Author(s):  
Qi Fan ◽  
◽  
Nitu Mandal ◽  
Mukul Dubey ◽  
Rakesh Gupta ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Aluminum Oxide ◽  
Anodic Aluminum Oxide ◽  
Oxide Thin Films ◽  
Anodic Aluminum

Optical properties of porous anodic aluminum oxide thin films on quartz substrates

2011 ◽  
Vol 519 (7) ◽  
pp. 2308-2312 ◽  
Author(s):  
Hong Zhuo ◽  
Fuchuan Peng ◽  
Limei Lin ◽  
Yan Qu ◽  
Fachun Lai
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Aluminum Oxide ◽  
Anodic Aluminum Oxide ◽  
Oxide Thin Films ◽  
Porous Anodic Aluminum Oxide ◽  
Anodic Aluminum ◽  
Quartz Substrates

Residual Stress Analysis of Al Alloy Thin Films by X-Ray Diffraction as a Function of Film Thickness

1988 ◽  
Vol 130 ◽  
Author(s):  
Carla J. Shute ◽  
J. B. Cohen ◽  
D. A. Jeannottea
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Film Thickness ◽  
Stress Analysis ◽  
Metal Film ◽  
High Stress ◽  
Al Alloy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Residual Stress Analysis

AbstractResidual stress has been measured as a function of layer thickness in thin films of an Al alloy on oxidized Si by the x-ray “d” versus sin2ψ technique. Samples with and without a passivation layer were examined. The results show an increase in residual stress with decreasing film thickness for the passivated samples and indicates that the interface between the metal film and SiO2 may be a region of high stress.

Vortex matching effects in Nb thin films due to Ni nanopillars embedded in anodic aluminum oxide substrates

2013 ◽  
Vol 26 (3) ◽  
pp. 035001 ◽  
Author(s):  
M Trezza ◽  
C Cirillo ◽  
A I Vorobjeva ◽  
E A Outkina ◽  
S L Prischepa ◽  
...  
Keyword(s):  
Thin Films ◽  
Aluminum Oxide ◽  
Anodic Aluminum Oxide ◽  
Anodic Aluminum ◽  
Oxide Substrates
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