CMOS-compatible, plasma beam assisted reactive magnetron sputtered silicon nitride films for photonic integrated circuits

Author(s):  
Andreas Frigg ◽  
Andreas Boes ◽  
Guanghui Ren ◽  
Duk-Yong Choi ◽  
Silvio Gees ◽  
...  
Author(s):  
Jeroen Goyvaerts ◽  
Sulakshna Kumari ◽  
Sarah Uvin ◽  
Jing Zhang ◽  
Roel Baets ◽  
...  

2019 ◽  
Vol 220 ◽  
pp. 03012
Author(s):  
Ilia Elmanov ◽  
Anna Elmanova ◽  
Sophia Komrakova ◽  
Alexander Golikov ◽  
Natalya Kaurova ◽  
...  

In the work the thicknesses of the e-beam resists ZEP 520A and ma-N 2400 by using non-destructive method were measured, as well as recipe for the high ratio between the Si3N4 and the resists etching rate was determined. The work has a practical application for e-beam lithography of photonic-integrated circuits and nanophotonics devices based on silicon nitride platform.


Author(s):  
Donghao Li ◽  
Bin Li ◽  
Bo Tang ◽  
Wenjuan Xiong ◽  
Peng Zhang ◽  
...  

IEEE Access ◽  
2020 ◽  
Vol 8 ◽  
pp. 195436-195446
Author(s):  
Tarun Sharma ◽  
Jiaqi Wang ◽  
Brajesh Kumar Kaushik ◽  
Zhenzhou Cheng ◽  
Roshan Kumar ◽  
...  

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