KrF excimer laser-based patterning system for dual applications in both lithography and ablation

Author(s):  
Julius Joseph S. Santillan ◽  
Nobutaka Uemori ◽  
Hiroshi Yamaoka ◽  
Toshiro Itani
1989 ◽  
Vol 28 (Part 1, No. 11) ◽  
pp. 2354-2356
Author(s):  
Yasuhiro Shimada ◽  
Koichi Wani ◽  
Yoshiro Ogata

2002 ◽  
Vol 407 (1-2) ◽  
pp. 126-131 ◽  
Author(s):  
Shin-ichi Aoqui ◽  
Hisatomo Miyata ◽  
Tamiko Ohshima ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara

1988 ◽  
Author(s):  
Hideo Nakagawa ◽  
Masaru Sasago ◽  
Masayuki Endo ◽  
Yushihiko Hirai ◽  
Kazufumi Ogawa ◽  
...  

1990 ◽  
Vol 29 (15) ◽  
pp. 2325 ◽  
Author(s):  
Robert W. Pitz ◽  
Joseph A. Wehrmeyer ◽  
J. M. Bowling ◽  
Tsarng-Sheng Cheng

1994 ◽  
Vol 105 (1-2) ◽  
pp. 133-141 ◽  
Author(s):  
H. Yoshida ◽  
K. Nakamura ◽  
H. Ninomiya ◽  
S. Horiguchi

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