Weak reflectivity measurement of FBGs by method of grating scale

2021 ◽  
Author(s):  
Qiushi Qin ◽  
Meng Wang ◽  
Binyu Rao ◽  
Zefeng Wang
Keyword(s):  
Reflectivity Measurement

Online reflectivity measurement of an ultra-weak fiber Bragg grating array

2013 ◽  
Vol 24 (10) ◽  
pp. 105102 ◽  
Author(s):  
Zhihui Luo ◽  
Hongqiao Wen ◽  
Xiaofu Li ◽  
Huiyong Guo
Keyword(s):  
Fiber Bragg Grating ◽  
Bragg Grating ◽  
Reflectivity Measurement ◽  
Grating Array

Development of element technologies for EUVL

2015 ◽  
Vol 4 (4) ◽  
Author(s):  
Hiroo Kinoshita ◽  
Takeo Watanabe ◽  
Tetsuo Harada
Keyword(s):  
Extreme Ultraviolet ◽  
Random Access ◽  
High Volume ◽  
Development Stage ◽  
Extreme Ultraviolet Lithography ◽  
Applied Physics ◽  
Reflectivity Measurement ◽  
Ultraviolet Lithography ◽  
Mask Inspection ◽  
The University

AbstractThirty years have passed since the first report on extreme ultraviolet lithography (EUVL) was presented at the annual meeting of the Japanese Society of Applied Physics in 1986. This technology is now in the manufacturing development stage. The high-volume manufacturing of dynamic-random-access-memory (DRAM) chips with a line width of 15 nm is expected in 2016. However, there are critical development issues that remain: generating a stand-alone EUV source with a higher power and producing a mask inspection tool for obtaining zero-defect masks. The Center for EUVL at the University of Hyogo was established in 2010. At present, it utilizes various types of equipment, such as an EUV mask defect inspection tool, an interference-lithography system, a device for measuring the thickness of carbon contamination film deposited by resist outgassing, and reflectivity measurement systems.

Image-based retro-reflectivity measurement of traffic signs in day time

2015 ◽  
Vol 29 (4) ◽  
pp. 1028-1040 ◽  
Author(s):  
Vahid Balali ◽  
Mohammad Amin Sadeghi ◽  
Mani Golparvar-Fard
Keyword(s):  
Traffic Signs ◽  
Reflectivity Measurement

Rapid X-ray reflectivity measurement using a new liquid interface reflectometer at SPring-8

2009 ◽  
Vol 167 (1) ◽  
pp. 101-105 ◽  
Author(s):  
Y. F. Yano ◽  
T. Uruga ◽  
H. Tanida ◽  
H. Toyokawa ◽  
Y. Terada ◽  
...  
Keyword(s):  
Liquid Interface ◽  
Reflectivity Measurement ◽  
X Ray

Design of laser power stabilization system based on acousto-optic modulation for the transmissivity and reflectivity measurement of optical devices

2016 ◽  
Vol 9 (2) ◽  
pp. 263-269 ◽  
Author(s):  
苗少峰 MIAO Shao-feng ◽  
李晨旭 LI Chen-xu ◽  
高 苗 GAO Miao ◽  
邵晓鹏 SHAO Xiao-peng ◽  
史学舜 SHI Xue-shun ◽  
...  
Keyword(s):  
Laser Power ◽  
Optical Devices ◽  
Stabilization System ◽  
Reflectivity Measurement ◽  
Power Stabilization
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