Silicon photonic devices for wavelength/mode-division-multiplexing

Author(s):  
Daoxin Dai ◽  
Zhuoning Zhu ◽  
Weike zhao ◽  
Yiwei Xie ◽  
Dajian Liu
Micromachines ◽  
2020 ◽  
Vol 11 (3) ◽  
pp. 326 ◽  
Author(s):  
Sailong Wu ◽  
Xin Mu ◽  
Lirong Cheng ◽  
Simei Mao ◽  
H.Y. Fu

In the past few decades, silicon photonics has witnessed a ramp-up of investment in both research and industry. As a basic building block, silicon waveguide crossing is inevitable for dense silicon photonic integrated circuits and efficient crossing designs will greatly improve the performance of photonic devices with multiple crossings. In this paper, we focus on the state-of-the-art and perspectives on silicon waveguide crossings. It reviews several classical structures in silicon waveguide crossing design, such as shaped taper, multimode interference, subwavelength grating, holey subwavelength grating and vertical directional coupler by forward or inverse design method. In addition, we introduce some emerging research directions in crossing design including polarization-division-multiplexing and mode-division-multiplexing technologies.


2021 ◽  
pp. 2000501
Author(s):  
Jorge Parra ◽  
Irene Olivares ◽  
Antoine Brimont ◽  
Pablo Sanchis

Nanophotonics ◽  
2014 ◽  
Vol 3 (4-5) ◽  
pp. 329-341 ◽  
Author(s):  
Raji Shankar ◽  
Marko Lončar

AbstractThe mid-infrared (IR) wavelength region (2–20 µm) is of great interest for a number of applications, including trace gas sensing, thermal imaging, and free-space communications. Recently, there has been significant progress in developing a mid-IR photonics platform in Si, which is highly transparent in the mid-IR, due to the ease of fabrication and CMOS compatibility provided by the Si platform. Here, we discuss our group’s recent contributions to the field of silicon-based mid-IR photonics, including photonic crystal cavities in a Si membrane platform and grating-coupled high-quality factor ring resonators in a silicon-on-sapphire (SOS) platform. Since experimental characterization of microphotonic devices is especially challenging at the mid-IR, we also review our mid-IR characterization techniques in some detail. Additionally, pre- and post-processing techniques for improving device performance, such as resist reflow, Piranha clean/HF dip cycling, and annealing are discussed.


2012 ◽  
Vol 20 (18) ◽  
pp. 20564 ◽  
Author(s):  
Li Fan ◽  
Leo T. Varghese ◽  
Yi Xuan ◽  
Jian Wang ◽  
Ben Niu ◽  
...  

Author(s):  
Robert Halir ◽  
Jose Manuel Luque-González ◽  
Alejandro Sánchez-Postigo ◽  
Carlos Pérez-Armenta ◽  
Pablo Ginel-Moreno ◽  
...  

2020 ◽  
Vol 26 (5) ◽  
pp. 1-20 ◽  
Author(s):  
Yiwei Xie ◽  
Yaocheng Shi ◽  
Liu Liu ◽  
Jianwei Wang ◽  
Rubana Priti ◽  
...  

2018 ◽  
Vol 35 (5) ◽  
pp. 1059 ◽  
Author(s):  
Ahmed S. Mayet ◽  
Hilal Cansizoglu ◽  
Yang Gao ◽  
Soroush Ghandiparsi ◽  
Ahmet Kaya ◽  
...  

Author(s):  
Padraic E. Morrissey ◽  
Peter O'Brien ◽  
Lee Carroll ◽  
Kamil Gradkowski

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