KOH etching process of perfect square MEMS corrugated diaphragm

2005 ◽  
Author(s):  
N. Soin ◽  
Burhanudin Y. Majlis
2020 ◽  
Vol 1004 ◽  
pp. 401-407
Author(s):  
Yusuke Sudoh ◽  
Makoto Kitabatake ◽  
Tadaaki Kaneko

We propose the Si-Vapor Etching (Si-VE), which is thermal chemical etching process, as epi-ready treatment for Silicon Carbide (SiC). In this work, we report the evaluation results of BPD-TED conversion by Si-VE treatment using repeated KOH etching process. This method makes it possible to observe BPD-TED conversion in a very shallow surface region of the SiC substrate. 80% of BPDs is converted to TEDs with a depth of more than 80nm under optimized Si-VE 2000°C conditions. Furthermore, 53% of BPDs were converted to TEDs with 140nm or more depth, which has been confirmed under optimized 1800°C Si-VE conditions.


2021 ◽  
Vol 1963 (1) ◽  
pp. 012009
Author(s):  
Alwan M Alwan ◽  
Ali A. Youssef ◽  
Aseel A. Chasb

Author(s):  
Norliana Yusof ◽  
Badariah Bais ◽  
Burhanuddin Yeop Majlis ◽  
Norhayati Soin ◽  
Jumril Yunas

<em><span>KOH wet etching is widely used in realizing MEMS diaphragm due to its low cost, safe and easy handling. However, wet etching process parameters need to be studied thoroughly in order to realize the desired shape and size of MEMS devices. This paper presents the numerical study and optimization of KOH etching process parameters using the response surface method (RSM). Face central composite design (FCC) of RSM was employed as the experimental design to analyze the result and generate a mathematical prediction model. From the analysis, the temperature was identified as the most significant process parameter that affects the etching rate, thus affecting the thickness and size of the diaphragm. The results of RSM prediction for optimization were applied in this study. Particularly, 45% of KOH concentration, temperature of 80°C, 1735 µm2 of mask size, and 7.2 hours of etching time were implemented to obtain a square MEMS diaphragm with thickness of 120 µm and size of 1200 µm2. The results of RSM based optimization method for KOH wet etching offers a quick and effective method for realizing a desired MEMS device.</span></em>


2009 ◽  
Vol 517 (12) ◽  
pp. 3578-3580 ◽  
Author(s):  
D. Muñoz ◽  
P. Carreras ◽  
J. Escarré ◽  
D. Ibarz ◽  
S. Martín de Nicolás ◽  
...  

Author(s):  
C.A.E. Lemmi ◽  
D. Booth ◽  
G.E. Adomian

In order to enrich populations of homogeneous cellular types we dissociated gastric mucosa by enzymatic techniques. In addition, we used SEM to monitor the progressive etching of the mucosa. Two enzymes were tested: collagenase III with minimum proteolytic activity and Pronase with broader proteolytic effects. The gastric mucosa was exposed to the effect of the enzymes using everted stomach preparations. In this way the digestive action occured progressively from the lumen of the stomach toward the base of the glands. This “etching” process could be monitored conveniently by SEM. After incubation for periods varying from 30 to 210 minutes the tissues were stretched on dental wax, fixed in 2 % glutaralheyde, post-fixed in osmium, dehydrated, critical point dryed and coated with gold. A model MSM-5 “Mini-SEM” was used for observation. Gentle uncurling of the preparation before coating with gold produced fractures which revealed the structure of the gastric glandsin more detail.


1992 ◽  
Vol 28 (3) ◽  
pp. 338
Author(s):  
A.S. Gozdz ◽  
J.A. Shelburne ◽  
R.S. Robinson ◽  
C.C. Chang
Keyword(s):  

Sign in / Sign up

Export Citation Format

Share Document