Chemical etching of nanocomposite metal-semiconductor films monitored by Raman spectroscopy and surface probe microscopy

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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.


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Flexible silicon nanowires fabricated by nano spheres lithography and metal assisted chemical etching for surface enhanced Raman spectroscopy.


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Vol 1348 ◽  
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V G Yakunin ◽  
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A F Alykova ◽  
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