Effects of substrate temperature on properties of the aluminum-doped zinc oxide thin films deposited by RF magnetron sputtering

Mapping Intimacies ◽

10.1117/12.843507 ◽

2009 ◽

Author(s):

Yanyan Yang ◽

Xiangbin Zeng

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Characterization of aluminum-doped zinc oxide thin films by RF magnetron sputtering at different substrate temperature and sputtering power

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-012-0769-7 ◽

2012 ◽

Vol 24 (1) ◽

pp. 166-171 ◽

Author(s):

Hung-Wei Wu ◽

Ru-Yuan Yang ◽

Chin-Min Hsiung ◽

Chien-Hsun Chu

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Sputtering Power ◽

Aluminum Doped Zinc Oxide

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Aluminum-Doped Zinc Oxide Thin Films Prepared by Sol-Gel and RF Magnetron Sputtering

Acta Physica Polonica A ◽

10.12693/aphyspola.120.149 ◽

2011 ◽

Vol 120 (1) ◽

pp. 149-152 ◽

Author(s):

G.M. Wu ◽

Y.F. Chen ◽

H.C. Lu

Keyword(s):

Magnetron Sputtering ◽

Sol Gel ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.23.l280 ◽

1984 ◽

Vol 23 (Part 2, No. 1) ◽

pp. L280-L282 ◽

Author(s):

Tadatsugu Minami ◽

Hidehito Nanto ◽

Shinzo Takata

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l605 ◽

1985 ◽

Vol 24 (Part 2, No. 8) ◽

pp. L605-L607 ◽

Author(s):

Tadatsugu Minami ◽

Hidehito Nanto ◽

Shinzo Takata

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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The properties of aluminum-doped zinc oxide thin films prepared by rf-magnetron sputtering from nanopowder targets

Materials Science and Engineering C ◽

10.1016/j.msec.2007.10.006 ◽

2008 ◽

Vol 28 (5-6) ◽

pp. 613-617 ◽

Author(s):

Z. Ben Ayadi ◽

L. El Mir ◽

K. Djessas ◽

S. Alaya

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Lowering the resistivity of aluminum doped zinc oxide thin films by controlling the self-bias during RF magnetron sputtering

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2020.126306 ◽

2020 ◽

Vol 402 ◽

pp. 126306 ◽

Author(s):

Eugen Stamate

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

The Self ◽

Oxide Thin Films ◽

Self Bias ◽

Aluminum Doped Zinc Oxide

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The influence of substrate temperature on the properties of aluminum-doped zinc oxide thin films deposited by DC magnetron sputtering

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-006-9039-x ◽

2006 ◽

Vol 17 (12) ◽

pp. 973-977 ◽

Author(s):

Yeon-Keon Moon ◽

Se-Hyun Kim ◽

Jong-Wan Park

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide ◽

Influence Of Substrate

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Optical Properties of Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.24.l851 ◽

1985 ◽

Vol 24 (10A) ◽

pp. L851 ◽

Author(s):

Tadatsugu Minami ◽

Hidehito Nanto ◽

Shinzo Takata

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Spatial distribution of plasma parameters by a dual thermal-electrostatic probe in RF and DC magnetron sputtering discharges during deposition of aluminum doped zinc oxide thin films

Plasma Sources Science and Technology ◽

10.1088/1361-6595/abec25 ◽

2021 ◽

Vol 30 (4) ◽

pp. 045002

Author(s):

Mihai-Andrei Petrea ◽

Eugen Stamate

Keyword(s):

Spatial Distribution ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Plasma Parameters ◽

Aluminum Doped Zinc Oxide ◽

Electrostatic Probe

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Influence of oxygen and argon flow on properties of aluminum-doped zinc oxide thin films prepared by magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2014.07.021 ◽

2014 ◽

Vol 566 ◽

pp. 32-37 ◽

Author(s):

Hua Zhu ◽

Hemei Wang ◽

Wenqiong Wan ◽

Shijin Yu ◽

XiaoWei Feng

Keyword(s):

Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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