Three-Dimensional Characterization of LiNbO3 Waveguides By Secondary Ion Mass Spectrometry (SIMS) Image Depth Profiling

Mapping Intimacies ◽

10.1117/12.963930 ◽

1990 ◽

Author(s):

Steven W. Novak ◽

Hilda Kanber ◽

Stephan Bar ◽

Champa Sridhar ◽

Robert Wilson

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Three Dimensional ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

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Secondary ion mass spectrometry/digital imaging for the three‐dimensional chemical characterization of solid state devices

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573263 ◽

1985 ◽

Vol 3 (6) ◽

pp. 2102-2107 ◽

Author(s):

S. R. Bryan ◽

W. S. Woodward ◽

R. W. Linton ◽

D. P. Griffis

Keyword(s):

Mass Spectrometry ◽

Solid State ◽

Digital Imaging ◽

Secondary Ion Mass Spectrometry ◽

Three Dimensional ◽

Chemical Characterization ◽

Solid State Devices ◽

Ion Mass Spectrometry ◽

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Three‐dimensional characterization of conducting polymer arrays using secondary ion mass spectrometry

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577958 ◽

1992 ◽

Vol 10 (4) ◽

pp. 2679-2684 ◽

Author(s):

K. H. Gray ◽

S. Gould ◽

R. M. Leasure ◽

I. H. Musselman ◽

J. J. Lee ◽

...

Keyword(s):

Mass Spectrometry ◽

Conducting Polymer ◽

Secondary Ion Mass Spectrometry ◽

Three Dimensional ◽

Ion Mass Spectrometry ◽

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Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon

10.3403/30199170u ◽

2015 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Surface Chemical ◽

Spectrometry Method ◽

Mass Spectrometry Method ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Surface Chemical Analysis

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Detection of Au+ Ions During Fluorine Gas-Assisted Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) for the Complete Elemental Characterization of Microbatteries

ACS Applied Materials & Interfaces ◽

10.1021/acsami.1c10352 ◽

2021 ◽

Vol 13 (34) ◽

pp. 41262-41274

Author(s):

Agnieszka Priebe ◽

Jordi Sastre ◽

Moritz H. Futscher ◽

Jakub Jurczyk ◽

Marcos V. Puydinger dos Santos ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Tof Sims ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Elemental Characterization

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Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Surface and Interface Analysis ◽

10.1002/sia.3776 ◽

2011 ◽

Vol 44 (1) ◽

pp. 89-93 ◽

Author(s):

Zihua Zhu ◽

Vaithiyalingam Shutthanandan

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion ◽

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Robust automated three-dimensional segmentation of secondary ion mass spectrometry image sets

Fresenius Journal of Analytical Chemistry ◽

10.1007/s002160051446 ◽

1999 ◽

Vol 365 (1-3) ◽

pp. 63-69 ◽

Author(s):

M. Wolkenstein ◽

T. Stubbings ◽

H. Hutter

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Three Dimensional ◽

Mass Spectrometry Image ◽

Ion Mass Spectrometry ◽

Three Dimensional Segmentation ◽

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Forensic Characterization of Lipsticks Using Time-of-Flight Secondary Ion Mass Spectrometry

Journal of Analytical Chemistry ◽

10.1134/s1061934821070091 ◽

2021 ◽

Vol 76 (7) ◽

pp. 854-867

Author(s):

Jihye Lee ◽

Yeonhee Lee

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Ion Mass Spectrometry ◽

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Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591222 ◽

2000 ◽

Vol 18 (1) ◽

pp. 509 ◽

Author(s):

R. Loesing ◽

G. M. Guryanov ◽

J. L. Hunter ◽

D. P. Griffis

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

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Secondary ion mass spectrometry (SIMS) applications on characterization of RF NPN bipolar polysilicon emitter process

10.1063/1.52570 ◽

1997 ◽

Author(s):

S. Lu

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Ion Mass Spectrometry ◽

Polysilicon Emitter ◽

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Secondary ion mass spectrometry depth profiling of 59Co implanted into nickel

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/s0168-583x(03)00837-1 ◽

2003 ◽

Vol 207 (3) ◽

pp. 339-344

Author(s):

L VINCENT ◽

T SAUVAGE ◽

S HOUDAYER ◽

C TESSIER ◽

S GAUTROT ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

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