Specific features of the current-voltage characteristics of diffuse glow discharges in Ar:N2 mixtures

2010 ◽  
Vol 36 (12) ◽  
pp. 1040-1064 ◽  
Author(s):  
N. A. Dyatko ◽  
Yu. Z. Ionikh ◽  
A. V. Meshchanov ◽  
A. P. Napartovich ◽  
K. A. Barzilovich
Keyword(s):  
Glow Discharges ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Diffuse Glow

Parametric Study of the Current–Voltage Characteristics of a 100-mbar DC Discharge in Argon: From the Diffuse Glow Discharge to the Arc Regime

2013 ◽  
Vol 41 (8) ◽  
pp. 2400-2407
Author(s):  
Romaric Landfried ◽  
Richard Andlauer ◽  
Philippe Dessante ◽  
Michael J. Kirkpatrick ◽  
Thierry Leblanc ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Parametric Study ◽  
Dc Discharge ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Diffuse Glow

scholarly journals Electrical glow discharges and plasma parameter of planar sputtering system for silver target

2018 ◽  
Vol 16 (37) ◽  
pp. 65-72
Author(s):  
Mazin H. Hasan
Keyword(s):  
Breakdown Voltage ◽  
Uniform Electric Field ◽  
Plasma Parameters ◽  
Argon Gas ◽  
Glow Discharges ◽  
Current Voltage ◽  
Paschen Curve ◽  
Silver Target ◽  
Current Voltage Characteristics ◽  
Sputtering System

DC planar sputtering system is characterized by varying discharge potential of (250-2000 volt) and Argon gas pressures of (3.5×10-2 – 1.5) mbar. The breakdown voltage for silver electrode was studied with a uniform electric field at different discharge distances, as well as plasma parameters. The breakdown voltage is a product of the Argon gas pressure inside the chamber and gab distance between the electrodes, represent as Paschen curve. The Current-voltage characteristics curves indicate that the electrical discharge plasma is working in the abnormal glow region. Plasma parameters were found from the current-voltage characteristics of a single probe positioned at the inter-cathode space. Typical values of the electron temperature and the electron density are in the range of (2.93 –5.3) eV and (10-16 -10-17) m-3 respectively.

Current–voltage characteristics of ionic liquid–air glow discharges

2013 ◽  
Vol 79 (5) ◽  
pp. 559-567 ◽  
Author(s):  
T. ABDUL KAREEM ◽  
A. ANU KALIANI
Keyword(s):  
Ionic Liquid ◽  
Glow Discharge ◽  
Critical Current ◽  
Ohm’S Law ◽  
Glow Discharges ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Ohm's Law

AbstractI–V characteristics of air glow discharge, ionic liquid–contact air glow discharge and ionic liquid–air glow discharge are presented and photographs of the discharges are shown. It is found that the I–V characteristics of the air glow discharge always obey Ohm's law but I–V characteristics of the ionic liquid–contact air glow discharge and ionic liquid–air glow discharge obey Ohm's law only up to a particular voltage. A sudden burst of the electrolyte is observed for currents above a critical current.

Atmospheric Pressure DC Plasma Microdischarges: A Characterization Study

2003 ◽  
Author(s):  
Jeong W. Yi ◽  
Fang Yan ◽  
Bakhtier Farouk
Keyword(s):  
Atmospheric Pressure ◽  
Electrode Materials ◽  
Flat Surface ◽  
Atmospheric Pressure Plasma ◽  
Plasma Potential ◽  
Dc Plasma ◽  
Glow Discharges ◽  
Characterization Study ◽  
Current Voltage ◽  
Current Voltage Characteristics

Atmospheric pressure dc plasma microdischarges were generated between a thin cylindrical electrode and a flat surface. The glow discharges were characterized both experimentally and numerically. As the applied voltage is increased, the plasma potential in the plasma microdischarge remains constant while the plasma current increases proportionally. For the types of electrode materials and the range of the electrode diameters considered, the current-voltage characteristics of the plasma microdischarge are almost independent of the electrode material and the diameter of the electrodes. Predictions from a numerical model of the argon microdischarge compare favorably with the experimental measurements and the visualization studies. The atmospheric pressure plasma microdischarge can be used for deposition of thin films and for microfabrication.

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