NOVEL VACUUM SYSTEM FOR IN-SITU CHARACTERIZATION OF FLUORESCENCE PROPERTIES OF THIN FILMS
2002 ◽
Vol 16
(28n29)
◽
pp. 4445-4448
◽
Keyword(s):
We constructed a novel vacuum system in which the cathode luminescence properties of as-prepared films can be measured in-situ. It has been observed that the Zn-Ga-O films deposited on 500°C ITO by sputtering emits light with wavelength of about 500 nm from an ultra thin Zn-rich layer formed near film surface. The luminescence induced by irradiation of electrons has also been observed for the first time in the organic bilayered TPD/Alq 3 films prepared in thermal evaporation. Its wavelength blue-shifts by about 120 nm in comparison with the electroluminescence of the same materials. The developed vacuum system is useful to characterize various thin films.
1992 ◽
Vol 10
(4)
◽
pp. 939-944
◽
2013 ◽
Vol 1
(36)
◽
pp. 10753
◽
Keyword(s):
1988 ◽
Vol 24
(2)
◽
pp. 1731-1733
◽
2010 ◽
Vol 30
(2)
◽
pp. 441-446
◽
1997 ◽
Vol 294
(1)
◽
pp. 67-70
◽
In situ characterization of plasma‐deposited a‐C:H thin films by spectroscopic infrared ellipsometry
1994 ◽
Vol 65
(9)
◽
pp. 2882-2889
◽