FABRICATION OF SU-8 BASED ELECTRO-OPTIC SWITCH USING ALL-WET ETCHING TECHNIQUE

2013 ◽  
Vol 27 (04) ◽  
pp. 1350024 ◽  
Author(s):  
XIBIN WANG ◽  
JIAN SUN ◽  
LIN JIN ◽  
JIE MENG ◽  
YUNFEI YAN ◽  
...  

Polymeric Disperse Red 1 (DR1)/SU-8 electro-optic (EO) switch incorporating inverted-rib waveguide structure is designed and fabricated by all-wet etching process. The guest-host EO material DR1/SU-8 has been successfully synthetized and its optical properties are characterized in detail. The DR1/SU-8 material presents a low processing cost, an excellent photostability and a large EO coefficient of 15.4 pm/V. The characteristic parameters of both the inverted-rib waveguide and the coplanar waveguide electrodes are carefully designed and simulated. By all-wet etching process, the optimized Mach–Zehnder interferometer switch is successfully fabricated with a lower fiber-to-fiber insertion loss of 9.6 dB. The switch rise time and fall time are 322 ns and 294 ns, respectively.

2016 ◽  
Vol 30 (06) ◽  
pp. 1650063 ◽  
Author(s):  
Jingwen Sun ◽  
Jian Sun ◽  
Yunji Yi ◽  
Lucheng Qv ◽  
Shiqi Sun ◽  
...  

A low-cost and high-speed electro-optic (EO) switch using the guest–host EO material Disperse Red 1/Polymethyl Methacrylate (DR1/PMMA) was designed and fabricated. The DR1/PMMA material presented a low processing cost, an excellent photostability and a large EO coefficient of 13.1 pm/V. To improve the performance of the switch, the in-plane buried electrode structure was introduced in the polymer Mach–Zehnder waveguide to improve the poling and modulating efficiency. The characteristic parameters of the waveguide and the electrodes were carefully designed and the fabrication process was strictly controlled. Under 1550 nm, the insertion loss of the device was 12.7 dB. The measured switching rise time and fall time of the switch were 50.00 ns and 54.29 ns, respectively.


2015 ◽  
Vol 645-646 ◽  
pp. 163-168
Author(s):  
Rui Lei ◽  
Wei Guo Liu ◽  
Chang Long Cai ◽  
Shun Zhou ◽  
Jing Nie ◽  
...  

Polyimide is often used as a sacrificial layer material to make floating structure. Polyimide is also divided into photosensitive and non-photosensitive type; photosensitive polyimide currently has more negative photoresist and poor performance in many ways. Compared with photosensitive polyimide, the non-photosensitive type has low stress, stable performance and other advantages, so non-photosensitive polyimide has been chosen as a sacrificial layer material. To achieve the graphical function and release sacrificial layer, A deeply research was made in this dissertation makes on wet etching and dry etching. By controlling the wet etching process of prebake condition, exposure and developing time, and oxygen dry etching process of etching power, bias voltage and other key process parameters, a good sacrificial layer graph and etching effect have been got. Finally, it can be concluded that when the prebake conditions for 105°C, 8min and times of exposure and developing were 11s and 29s, the non-photosensitive polyimide wet etching effect is the best; when the etching power is 1000w, an oxygen flux rate is 50sccm, the reaction pressure is 30mTorr, the bias voltage is 140v, oxygen dry etching has a good effect.


2016 ◽  
Vol 24 (25) ◽  
pp. 28573 ◽  
Author(s):  
Sébastien Vigne ◽  
Nadir Hossain ◽  
Faezeh Fesharaki ◽  
S. M. Humayun Kabir ◽  
Joëlle Margot ◽  
...  

CLEO: 2014 ◽  
2014 ◽  
Author(s):  
Faezeh Fesharaki ◽  
Nadir Hossain ◽  
Sebastien Vigne ◽  
Joelle Margot ◽  
Ke Wu ◽  
...  

2003 ◽  
Vol 83 (23) ◽  
pp. 4692-4694 ◽  
Author(s):  
Y. Enami ◽  
G. Meredith ◽  
N. Peyghambarian ◽  
A. K.-Y. Jen

2008 ◽  
Vol 55 (12) ◽  
pp. 1859-1869 ◽  
Author(s):  
Xin Yan ◽  
Chuan-Tao Zheng ◽  
Xian-Yin Wang ◽  
Da-Ming Zhang ◽  
Chun-Sheng Ma

RSC Advances ◽  
2015 ◽  
Vol 5 (83) ◽  
pp. 67646-67651 ◽  
Author(s):  
Xi-Bin Wang ◽  
Jing-Wen Sun ◽  
Jian Sun ◽  
Zuo-Sen Shi ◽  
Fei Wang ◽  
...  

A Mach–Zehnder interferometer type of optic switch with electro-optic polymer-clad waveguides was fabricated with the simple wet-etching procedure, which exhibited low insertion loss and high-speed switching response.


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