HETEROJUNCTION BAND DISCONTINUITY CHANGE BY ULTRATHIN INTRALAYER: Na

1993 ◽  
Vol 07 (07) ◽  
pp. 459-464 ◽  
Author(s):  
SHIHONG XU ◽  
XIANMING LIU ◽  
MAOSHENG MA ◽  
JINGSHENG ZHU ◽  
YUHENG ZHANG ◽  
...  

The changes of band offset of Ge-GaAs(100) heterojunction are observed by means of an ultrathin Na intralayer with the photoemission spectroscopy. 1 ML Na intralayer increases the valence-band discontinuity of Ge-GaAs by 0.19 eV on the average.

2010 ◽  
Vol 150 (41-42) ◽  
pp. 1991-1994 ◽  
Author(s):  
H.P. Song ◽  
G.L. Zheng ◽  
A.L. Yang ◽  
Y. Guo ◽  
H.Y. Wei ◽  
...  

1995 ◽  
Vol 378 ◽  
Author(s):  
Art J. Nelson ◽  
K. Sinha ◽  
John Moreland

AbstractSynchrotron radiation soft x-ray photoemission spectroscopy was used to investigate the development of the electronic structure at the CdS/Cu2Se heterojunction interface. Cu2−xSe layers were deposited on GaAs (100) by molecular beam epitaxy from Cu2Se sources. Raman spectra reveal a strong peak at 270 cm−1, indicative of the Cu2−xSe phase. Atomic force microscopy reveals uniaxial growth in a preferred (100) orientation. CdS overlayers were then deposited in-situ, at room temperature, in steps on these epilayers. Photoemission measurements were acquired after each growth in order to observe changes in the valence band electronic structure as well as changes in the Se3d and Cd4d core lines. The results were used to correlate the interfacial chemistry with the electronic structure and to directly determine the CdS/Cu2−xSe and heterojunction valence band discontinuity and the consequent heterojunction band diagram. These results are compared to the valence band offset (ΔEv) for the CdS/CuInSe2 heterojunction interface.


1995 ◽  
Vol 24 (4) ◽  
pp. 225-227 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  

1994 ◽  
Vol 65 (5) ◽  
pp. 610-612 ◽  
Author(s):  
G. Martin ◽  
S. Strite ◽  
A. Botchkarev ◽  
A. Agarwal ◽  
A. Rockett ◽  
...  

1991 ◽  
Vol 220 ◽  
Author(s):  
S. Khorram ◽  
C. H. Chern ◽  
K. L. Wang

ABSTRACTThe valence band discontinuity ΔEV in the coherently strained GexSi1−x/Si heterostruc-ture is determined using I-V-T measurement. The electrical measurements of the band discontinuity of the pseudomorphic layers are difficult due to the thin layer imposed by the strain. Recently, low temperature growth of thick layer (>100 nm) of coherently strained GexSi1−x on Si has been achieved and thus made it possible for an accurate electrical measurement of band offset. The results obtained are in good agreement with the theoretical calculations by pseudopotential method.


2009 ◽  
Vol 97 (2) ◽  
pp. 475-479 ◽  
Author(s):  
Tingting Tan ◽  
Zhengtang Liu ◽  
Hongcheng Lu ◽  
Wenting Liu ◽  
Feng Yan ◽  
...  

2008 ◽  
Vol 78 (3) ◽  
Author(s):  
P. D. C. King ◽  
T. D. Veal ◽  
C. E. Kendrick ◽  
L. R. Bailey ◽  
S. M. Durbin ◽  
...  

2008 ◽  
Vol 93 (20) ◽  
pp. 202108 ◽  
Author(s):  
T. D. Veal ◽  
P. D. C. King ◽  
S. A. Hatfield ◽  
L. R. Bailey ◽  
C. F. McConville ◽  
...  

1987 ◽  
Vol 94 ◽  
Author(s):  
David W. Niles ◽  
Ming Tang ◽  
Hartmut Höchst

ABSTRACTWe have used angular resolved ultraviolet photoemission spectroscopy to study the epitaxial growth of Si on GaP(110). Surface state emission obscures the top of the valence band (TVB). The Fermi level for the clean GaP(110) surface is 1.20±0.05eV above the TVB. 1ML (monolayer) of Si pins the Fermi level position at 1.40±0.05eV above the TVB. Further deposition of Si leads to a valence band discontinuity ΔEv=1.07 ±0.10eV.


2020 ◽  
Vol 529 ◽  
pp. 147126 ◽  
Author(s):  
E.G. LeBlanc ◽  
D. Leinen ◽  
M. Edirisooriya ◽  
A. Los ◽  
T.H. Myers

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