Reactive Ion Beam Etching Using a Broad Beam ECR Ion Source

1982 ◽  
Vol 21 (Part 2, No. 1) ◽  
pp. L4-L6 ◽  
Author(s):  
Seitaro Matsuo ◽  
Yoshio Adachi
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ecr Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam ◽  
Reactive Ion Beam Etching

A 16 cm broad‐beam ion source for ion‐beam etching of quartz wafers

1996 ◽  
Vol 67 (3) ◽  
pp. 1009-1011
Author(s):  
Yusheng Rao ◽  
Ming Li ◽  
Bo Qi ◽  
Fei Li
Keyword(s):  
Ion Beam ◽  
Ion Source ◽  
Ion Beam Etching ◽  
Broad Beam

Reactive Ion Beam Etching Using a Selective Gallium Doping Method

1989 ◽  
Vol 28 (Part 2, No. 9) ◽  
pp. L1671-L1672
Author(s):  
Kyusaku Nishioka ◽  
Hiroaki Morimoto ◽  
Yoji Mashiko ◽  
Tadao Kato
Keyword(s):  
Ion Beam ◽  
Ion Beam Etching ◽  
Gallium Doping ◽  
Reactive Ion Beam Etching

Ion Beam Extraction from Large Bore 11 to 13 GHz ECR Ion Source with a Pair of Cylindrically Comb-Shaped Magnetic Fields

2008 ◽  
Author(s):  
T. Watanabe ◽  
T. Satani ◽  
Y. Matsui ◽  
F. Sato ◽  
Y. Kato ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Extraction ◽  
Ecr Ion Source
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