A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si
1982 ◽
Vol 20
(4)
◽
pp. 986-988
◽
1994 ◽
Vol 33
(Part 2, No. 3A)
◽
pp. L390-L393
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1997 ◽
Vol 144
(9)
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pp. 3191-3197
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2002 ◽
Vol 41
(Part 1, No. 1)
◽
pp. 15-19
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1994 ◽
Vol 33
(Part 2, No. 10A)
◽
pp. L1382-L1385
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1998 ◽
Vol 37
(Part 1, No. 6A)
◽
pp. 3576-3584
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1991 ◽
Vol 9
(2)
◽
pp. 380
◽