A 26‐cm electron‐cyclotron‐resonance ion source for reactive ion beam etching of SiO2 and Si

1982 ◽  
Vol 20 (4) ◽  
pp. 986-988 ◽  
Author(s):  
M. Miyamura ◽  
O. Tsukakoshi ◽  
S. Komiya
1997 ◽  
Vol 144 (9) ◽  
pp. 3191-3197 ◽  
Author(s):  
K. Nishioka ◽  
M. Sugiyama ◽  
M. Nezuka ◽  
Y Shimogaki ◽  
Y. Nakano ◽  
...  

2002 ◽  
Vol 41 (Part 1, No. 1) ◽  
pp. 15-19 ◽  
Author(s):  
Tatsuya Suzuki ◽  
Nobuo Haneji ◽  
Kunio Tada ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nakano

1995 ◽  
Vol 67 (7) ◽  
pp. 897-899 ◽  
Author(s):  
Masakazu Sugiyama ◽  
Takayuki Yamaizumi ◽  
Masahiro Nezuka ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nanako ◽  
...  

2012 ◽  
Vol 83 (2) ◽  
pp. 02A333 ◽  
Author(s):  
Y. Higurashi ◽  
J. Ohnishi ◽  
T. Nakagawa ◽  
H. Haba ◽  
M. Tamura ◽  
...  

2007 ◽  
Vol 78 (10) ◽  
pp. 103503 ◽  
Author(s):  
Jin-Soo Kim ◽  
L. Zhao ◽  
B. P. Cluggish ◽  
Richard Pardo

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