Bi-Level Structures for Focused Ion Beam Using Maskless Ion Etching

1984 ◽  
Vol 23 (Part 2, No. 3) ◽  
pp. L172-L174 ◽  
Author(s):  
Shinji Matsui ◽  
Katsumi Mori ◽  
Takao Shiokawa ◽  
Koichi Toyoda ◽  
Susumu Namba
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Etching

Deep reactive ion etching and focused ion beam combination for nanotip fabrication

2006 ◽  
Vol 26 (2-3) ◽  
pp. 164-168 ◽  
Author(s):  
G. Villanueva ◽  
J.A. Plaza ◽  
A. Sánchez-Amores ◽  
J. Bausells ◽  
E. Martínez ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Beam Combination

Sharp High-Aspect-Ratio AFM Tips Fabricated by a Combination of Deep Reactive Ion Etching and Focused Ion Beam Techniques

2010 ◽  
Vol 10 (1) ◽  
pp. 497-501 ◽  
Author(s):  
David Caballero ◽  
Guillermo Villanueva ◽  
Jose Antonio Plaza ◽  
Christopher A. Mills ◽  
Josep Samitier ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Afm Tips

scholarly journals Fabrication of probe tips via the FIB method for nanodiagnostics of the surface of solids by atomic force microscopy

2021 ◽  
Vol 2086 (1) ◽  
pp. 012204
Author(s):  
D J Rodriguez ◽  
A V Kotosonova ◽  
H A Ballouk ◽  
N A Shandyba ◽  
O I Osotova ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Atomic Force Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Contact Mode ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Abstract In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.

Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching

2008 ◽  
Vol 18 (3) ◽  
pp. 035003 ◽  
Author(s):  
H X Qian ◽  
Wei Zhou ◽  
Jianmin Miao ◽  
Lennie E N Lim ◽  
X R Zeng
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Ion Beam Implantation

Dry fabrication of microdevices by the combination of focused ion beam and cryogenic deep reactive ion etching

2010 ◽  
Vol 20 (8) ◽  
pp. 085009 ◽  
Author(s):  
N Chekurov ◽  
K Grigoras ◽  
L Sainiemi ◽  
A Peltonen ◽  
I Tittonen ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Deep Reactive Ion Etching

Fabrication of Molds with 25-nm Dot-Pitch Pattern by Focused Ion Beam and Reactive Ion Etching for Nanoimprint Using Metallic Glass

2012 ◽  
Vol 51 (8R) ◽  
pp. 086702 ◽  
Author(s):  
Yasuyuki Fukuda ◽  
Yasunori Saotome ◽  
Nobuyuki Nishiyama ◽  
Noriko Saidoh ◽  
Eiichi Makabe ◽  
...  
Keyword(s):  
Metallic Glass ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
Pitch Pattern
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