Structural Properties of Silicon Oxide Films Prepared by the RF Substrate Biased ECR Plasma CVD Method

1989 ◽  
Vol 28 (Part 2, No. 6) ◽  
pp. L1048-L1050 ◽  
Author(s):  
Masatoshi Kitagawa ◽  
Takashi Hirao ◽  
Takuichi Ohmura ◽  
Tomio Izumi
Keyword(s):  
Structural Properties ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Plasma Cvd ◽  
Ecr Plasma ◽  
Cvd Method

Effects of Applied Magnetic Fields on Silicon Oxide Films Formed by Microwave Plasma CVD

1988 ◽  
Vol 27 (Part 2, No. 10) ◽  
pp. L1962-L1965 ◽  
Author(s):  
Takuya Fukuda ◽  
Kazuo Suzuki ◽  
Shigeru Takahashi ◽  
Yasuhiro Mochizuki ◽  
Michio Ohue ◽  
...  
Keyword(s):  
Magnetic Fields ◽  
Silicon Oxide ◽  
Microwave Plasma ◽  
Oxide Films ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

scholarly journals Deposition of Silicon Oxide Film on Unheated Substrate Using Low Frequency 50Hz Plasma CVD Method

1991 ◽  
Vol 111 (12) ◽  
pp. 1064-1070
Author(s):  
Mitsuo Shimozuma ◽  
Motohiro Ishikawa ◽  
Gen Tochitani ◽  
Hiroaki Tagashira
Keyword(s):  
Oxide Film ◽  
Silicon Oxide ◽  
Low Frequency ◽  
Plasma Cvd ◽  
Silicon Oxide Film ◽  
Cvd Method

Ion Beam Analysis of the Concentration and Thermal Release of Hydrogen in Silicon Nitride Films Prepared by ECR Plasma CVD Method

1988 ◽  
Vol 27 (Part 1, No. 8) ◽  
pp. 1406-1410 ◽  
Author(s):  
Takashi Kuroi ◽  
Kenji Umezawa ◽  
Junji Yamane ◽  
Fumiya Shoji ◽  
Kenjiro Oura ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Ion Beam ◽  
Plasma Cvd ◽  
Ion Beam Analysis ◽  
Ecr Plasma ◽  
Cvd Method ◽  
Thermal Release ◽  
Silicon Nitride Films ◽  
Beam Analysis

Annealing behavior of silicon nitride and silicon oxynitride films prepared by ECR plasma CVD method

1988 ◽  
Vol 33-34 ◽  
pp. 1094-1100 ◽  
Author(s):  
Takeshi Kamada ◽  
Takashi Hirao ◽  
Masatoshi Kitagawa ◽  
Kentaro Setsune ◽  
Kiyotaka Wasa ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Silicon Oxynitride ◽  
Plasma Cvd ◽  
Annealing Behavior ◽  
Ecr Plasma ◽  
Cvd Method

Effects of Ions on Properties of a-Si:H Films Prepared by ECR Plasma CVD Method

1988 ◽  
Vol 27 (Part 1, No. 12) ◽  
pp. 2192-2198 ◽  
Author(s):  
Koji Akiyama ◽  
Eiichiro Tanaka ◽  
Akio Takimoto ◽  
Masanori Watanabe
Keyword(s):  
Plasma Cvd ◽  
Ecr Plasma ◽  
Cvd Method

Role of Ions and Radical Species in Silicon Nitride Deposition by ECR Plasma CVD Method

1987 ◽  
Vol 26 (Part 2, No. 5) ◽  
pp. L544-L546 ◽  
Author(s):  
Takashi Hirao ◽  
Kentaro Setsune ◽  
Masatoshi Kitagawa ◽  
Yoshio Manabe ◽  
Kiyotaka Wasa ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Plasma Cvd ◽  
Radical Species ◽  
Ecr Plasma ◽  
Cvd Method
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