Large-Area Doping Process for Fabrication of poly-Si Thin Film Transistors Using Bucket Ion Source and XeCl Excimer Laser Annealing
1990 ◽
Vol 29
(Part 2, No. 12)
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pp. L2370-L2372
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1993 ◽
Vol 40
(11)
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pp. 1964-1969
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1994 ◽
Vol 33
(Part 1, No. 4A)
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pp. 2092-2099
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2008 ◽
Vol 55
(8)
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pp. 2129-2133
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1992 ◽
Vol 31
(Part 1, No. 4)
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pp. 1012-1015
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