Reduction of Point Defects and Formation of Abrupt Hetero-Interfaces in Low-Temperature Molecular Beam Epitaxy of GaAs and GaP under Atomic Hydrogen Irradiation

1998 ◽  
Vol 37 (Part 1, No. 9A) ◽  
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Mikihiro Yokozeki ◽  
Hiroo Yonezu ◽  
Takuto Tsuji ◽  
Kazuya Aizawa ◽  
Naoki Ohshima
1993 ◽  
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J. Mäkinen ◽  
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K. Saarinen ◽  
C. Corbel ◽  
...  

1994 ◽  
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pp. 759-762 ◽  
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Yoshitaka Okada ◽  
Shigeru Ohta ◽  
Tomoya Fujita ◽  
Mitsuo Kawabe

1993 ◽  
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H.-J. Gossmann ◽  
F. C. Unterwald ◽  
L. C. Feldman ◽  
T. C. Leung ◽  
...  

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Y. Ando ◽  
K. Yamane ◽  
...  

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D. Inoue ◽  
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1991 ◽  
Vol 241 ◽  
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Bijan Tadayon ◽  
Mohammad Fatemi ◽  
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F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


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