Preparation and Characterization of Epitaxial Lead Zirconate Titanate Films on Pt/(Ti, Al)N/TiN/Si Substrates by Metalorganic Chemical Vapor Deposition

Atsushi Sakurai; Xio Min Li; Kohsuke Shiratsuyu; Katsuhiko Tanaka; Yukio Sakabe

doi:10.1143/jjap.39.5441

Preparation and Characterization of Epitaxial Lead Zirconate Titanate Films on Pt/(Ti, Al)N/TiN/Si Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.5441 ◽

2000 ◽

Vol 39 (Part 1, No. 9B) ◽

pp. 5441-5445 ◽

Cited By ~ 6

Author(s):

Atsushi Sakurai ◽

Xio Min Li ◽

Kohsuke Shiratsuyu ◽

Katsuhiko Tanaka ◽

Yukio Sakabe

Keyword(s):

Chemical Vapor Deposition ◽

Lead Zirconate Titanate ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Lead Zirconate ◽

Si Substrates ◽

Zirconate Titanate ◽

Metalorganic Chemical

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Preparation and Characterization of Epitaxial Lead Zirconate Titanate Films on Pt/MgO Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.5812 ◽

1997 ◽

Vol 36 (Part 1, No. 9B) ◽

pp. 5812-5814 ◽

Cited By ~ 8

Author(s):

Atsushi Sakurai ◽

Kohsuke Shiratsuyu ◽

Hiroshi Takagi ◽

Yukio Sakabe

Keyword(s):

Chemical Vapor Deposition ◽

Lead Zirconate Titanate ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Lead Zirconate ◽

Zirconate Titanate ◽

Metalorganic Chemical

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Growth and characterization of GaAs grown on Si substrates by metalorganic chemical vapor deposition.

DENKI-SEIKO ◽

10.4262/denkiseiko.57.279 ◽

1986 ◽

Vol 57 (4) ◽

pp. 279-285

Author(s):

Mitsuru Imaizumi ◽

Shiro Sakai ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Characterization of epitaxially grown GaAs on Si substrates with III‐V compounds intermediate layers by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.335363 ◽

1985 ◽

Vol 57 (10) ◽

pp. 4578-4582 ◽

Cited By ~ 67

Author(s):

Tetsuo Soga ◽

Shuzo Hattori ◽

Shiro Sakai ◽

Masanari Takeyasu ◽

Masayoshi Umeno

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Gaas On Si ◽

Intermediate Layers ◽

Metalorganic Chemical

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Characterization of GaAs layers grown directly on Si substrates by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.339690 ◽

1987 ◽

Vol 62 (3) ◽

pp. 862-867 ◽

Cited By ~ 28

Author(s):

S. J. Pearton ◽

S. M. Vernon ◽

C. R. Abernathy ◽

K. T. Short ◽

R. Caruso ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Growth and Characterization of GaAs Layers Grown on Ge/Si Substrates by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.485 ◽

1988 ◽

Vol 27 (Part 1, No. 4) ◽

pp. 485-488 ◽

Cited By ~ 13

Author(s):

Yukio Fukuda ◽

Yoshiaki Kadota ◽

Yoshiro Ohmachi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Structural characterization of ZnO nanopillars grown by atmospheric-pressure metalorganic chemical vapor deposition on vicinal 4H-SiC and SiO2/Si substrates

Journal of Applied Physics ◽

10.1063/1.3549140 ◽

2011 ◽

Vol 109 (4) ◽

pp. 043507-043507-8 ◽

Cited By ~ 6

Author(s):

I. Tsiaoussis ◽

V. Khranovskyy ◽

G. P. Dimitrakopulos ◽

J. Stoemenos ◽

R. Yakimova ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structural Characterization ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Si Substrates ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition and characterization of the In‐As‐Sb‐Bi material system for infrared detection

Applied Physics Letters ◽

10.1063/1.100350 ◽

1988 ◽

Vol 53 (2) ◽

pp. 142-144 ◽

Cited By ~ 34

Author(s):

T. P. Humphreys ◽

P. K. Chiang ◽

S. M. Bedair ◽

N. R. Parikh

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Infrared Detection ◽

Material System ◽

Metalorganic Chemical

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Low-pressure Metalorganic Chemical Vapor Deposition and Characterization of YBa2Cu3O7−x Thin Films

Superconductivity and Applications ◽

10.1007/978-1-4684-7565-4_11 ◽

1990 ◽

pp. 127-138

Author(s):

P. Zawadzki ◽

G. S. Tompa ◽

P. Norris ◽

D. W. Noh ◽

B. Gallois ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Characterization of homoepitaxial YBa2Cu3Ox films grown by metalorganic chemical vapor deposition

Physica C Superconductivity ◽

10.1016/s0921-4534(97)00393-6 ◽

1997 ◽

Vol 282-287 ◽

pp. 587-588 ◽

Cited By ~ 1

Author(s):

H. Zama ◽

N. Tanaka ◽

S. Koyama ◽

T. Morishita

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Growth and Characterization of High-Speed Carbon-Doped-Base InP/InGaAs Heterojunction Bipolar Transistors by Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.35.3343 ◽

1996 ◽

Vol 35 (Part 1, No. 6A) ◽

pp. 3343-3349 ◽

Cited By ~ 17

Author(s):

Hiroshi Ito ◽

Shoji Yamahata ◽

Naoteru Shigekawa ◽

Kenji Kurishima ◽

Yutaka Matsuoka

Keyword(s):

Chemical Vapor Deposition ◽

Heterojunction Bipolar Transistors ◽

Vapor Deposition ◽

High Speed ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Bipolar Transistors ◽

Carbon Doped ◽

Metalorganic Chemical

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