Refractive Index, Density and Polarizability of Silica Glass with Various Fictive Temperatures

2004 ◽  
Vol 43 (No. 6A) ◽  
pp. L743-L745 ◽  
Author(s):  
Hiroshi Kakiuchida ◽  
Kazuya Saito ◽  
Akira J. Ikushima
1996 ◽  
Vol 79 (2) ◽  
pp. 1060 ◽  
Author(s):  
Kohei Fukumi ◽  
Akiyoshi Chayahara ◽  
Naoyuki Kitamura ◽  
Junji Nishii ◽  
Kohei Kadono ◽  
...  

Author(s):  
Naoyuki Kitamura ◽  
Yutaka Toguchi ◽  
Shigeki Funo ◽  
Isao Kondoh ◽  
Hiroshi Yamashita

1991 ◽  
Vol 127 (2) ◽  
pp. 191-196 ◽  
Author(s):  
Koji Tsukuma ◽  
Nobusuke Yamada ◽  
Shinichi Kondo ◽  
Keishi Honda ◽  
Hideaki Segawa

2007 ◽  
Vol 14 (06) ◽  
pp. 1079-1082 ◽  
Author(s):  
HONGXIA LI ◽  
XIN WU ◽  
RENGUO SONG ◽  
JIYANG WANG

High-quality Nd:LuVO 4 thin films have been grown on silica glass substrates by using a pulsed laser deposition technique. X-ray diffraction results show that the as-deposited Nd:LuVO 4 film is basically oriented polycrystalline, and strong (200) peak was revealed. The waveguide property was characterized by the prism-coupling method. The refractive index of the propagation mode is higher than that of the silica glass substrate which means that the dips correspond to real propagation mode, where the light could be well defined. The surface morphology of the deposited Nd:LuVO 4 films was also observed by using an atomic force microscopy.


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