Optical Band Gap of Barium Titanate Nanoparticles Prepared by RF-plasma Chemical Vapor Deposition

2005 ◽  
Vol 44 (4A) ◽  
pp. 2081-2082 ◽  
Author(s):  
Keigo Suzuki ◽  
Kazunori Kijima
Keyword(s):  
Chemical Vapor Deposition ◽  
Barium Titanate ◽  
Band Gap ◽  
Vapor Deposition ◽  
Optical Band Gap ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Barium Titanate Nanoparticles

THE OPTICAL CHARACTERISTICS OF NITROGEN-DOPED AMORPHOUS CARBON THIN-FILMS GROWN ON NOVEL HEAT-TOLERANT FLEXIBLE PLASTIC SUBSTRATES BY A NEWLY DEVELOPED MICROWAVE SURFACE WAVE PLASMA CHEMICAL VAPOR DEPOSITION METHOD

2004 ◽  
Vol 11 (06) ◽  
pp. 585-589 ◽  
Author(s):  
M. RUSOP ◽  
A. M. M. OMER ◽  
S. ADHIKARI ◽  
S. ADHIKARY ◽  
H. UCHIDA ◽  
...  
Keyword(s):  
Thin Films ◽  
Band Gap ◽  
Vapor Deposition ◽  
Optical Band Gap ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plastic Substrates ◽  
Plasma Chemical Vapor Deposition ◽  
Nitrogen Doped ◽  
Heat Tolerant

Nitrogen-doped amorphous carbon ( a - C : N ) thin-films have been deposited on novel heat tolerant flexible plastic substrates by a newly developed microwave surface wave plasma chemical vapor deposition (MWSWP-CVD) method. Methane gas and also camphor dissolved with ethyl alcohol gas composition have been used as plasma source. Nitrogen gas has been used as a dopant material for a - C : N films. In this paper, the optical characteristics of absorption coefficients and band gaps for a - C : N are discussed. The optical band gap of a - C : N films was found to be approximately 1.7 eV, which is close to the suitable band gap for solar cell. The optical band gap of a - C : N was found to be dependent on the composition gas source pressures.

Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition

2001 ◽  
Vol 40 (Part 2, No. 6B) ◽  
pp. L631-L634 ◽  
Author(s):  
Takashi Hirao ◽  
Korekiyo Ito ◽  
Hiroshi Furuta ◽  
Yoke Khin Yap ◽  
Takashi Ikuno ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
Plasma Chemical ◽  
Vertically Aligned Carbon Nanotubes ◽  
Plasma Chemical Vapor Deposition ◽  
Aligned Carbon Nanotubes ◽  
Vertically Aligned
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