THE OPTICAL CHARACTERISTICS OF NITROGEN-DOPED AMORPHOUS CARBON THIN-FILMS GROWN ON NOVEL HEAT-TOLERANT FLEXIBLE PLASTIC SUBSTRATES BY A NEWLY DEVELOPED MICROWAVE SURFACE WAVE PLASMA CHEMICAL VAPOR DEPOSITION METHOD
Nitrogen-doped amorphous carbon ( a - C : N ) thin-films have been deposited on novel heat tolerant flexible plastic substrates by a newly developed microwave surface wave plasma chemical vapor deposition (MWSWP-CVD) method. Methane gas and also camphor dissolved with ethyl alcohol gas composition have been used as plasma source. Nitrogen gas has been used as a dopant material for a - C : N films. In this paper, the optical characteristics of absorption coefficients and band gaps for a - C : N are discussed. The optical band gap of a - C : N films was found to be approximately 1.7 eV, which is close to the suitable band gap for solar cell. The optical band gap of a - C : N was found to be dependent on the composition gas source pressures.