Metal-Assisted Chemical Etching Using Silica Nanoparticle for the Fabrication of a Silicon Nanowire Array

2012 ◽  
Vol 51 (2) ◽  
pp. 02BP09 ◽  
Author(s):  
Shinya Kato ◽  
Yuya Watanabe ◽  
Yasuyoshi Kurokawa ◽  
Akira Yamada ◽  
Yoshimi Ohta ◽  
...  
2012 ◽  
Vol 51 (2S) ◽  
pp. 02BP09 ◽  
Author(s):  
Shinya Kato ◽  
Yuya Watanabe ◽  
Yasuyoshi Kurokawa ◽  
Akira Yamada ◽  
Yoshimi Ohta ◽  
...  

Nanomaterials ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 1531 ◽  
Author(s):  
Shi Bai ◽  
Yongjun Du ◽  
Chunyan Wang ◽  
Jian Wu ◽  
Koji Sugioka

Surface-enhanced Raman spectroscopy (SERS) has advanced over the last four decades and has become an attractive tool for highly sensitive analysis in fields such as medicine and environmental monitoring. Recently, there has been an urgent demand for reusable and long-lived SERS substrates as a means of reducing the costs associated with this technique To this end, we fabricated a SERS substrate comprising a silicon nanowire array coated with silver nanoparticles, using metal-assisted chemical etching followed by photonic reduction. The morphology and growth mechanism of the SERS substrate were carefully examined and the performance of the fabricated SERS substrate was tested using rhodamine 6G and dopamine hydrochloride. The data show that this new substrate provides an enhancement factor of nearly 1 × 108. This work demonstrates that a silicon nanowire array coated with silver nanoparticles is sensitive and sufficiently robust to allow repeated reuse. These results suggest that this newly developed technique could allow SERS to be used in many commercial applications.


2012 ◽  
Vol 1408 ◽  
Author(s):  
Arif S. Alagoz ◽  
Tansel Karabacak

ABSTRACTMetal-assisted chemical etching is a simple and low-cost silicon nanowire fabrication method which allows control of nanowire diameter, length, shape and orientation. In this work, we fabricated well-ordered silicon nanowire array by patterning gold thin film by nanosphere lithography and etching single crystalline silicon wafer by metal-assisted chemical etching technique. We investigated relation between etched solution concentration and nanowire morphology, wafer crystal orientation, etching rate. This well-ordered silicon nanowires arrays have the potential applications in many fields but especially next generation energy related applications from solar cells to lithium-ion batteries.


2011 ◽  
Vol 10 ◽  
pp. 33-37 ◽  
Author(s):  
Ludovic Dupré ◽  
Denis Buttard ◽  
Pascal Gentile ◽  
Nicolas Pauc ◽  
Amit Solanki

2014 ◽  
Vol 24 (1) ◽  
pp. 105-105 ◽  
Author(s):  
Junghoon Yeom ◽  
Daniel Ratchford ◽  
Christopher R. Field ◽  
Todd H. Brintlinger ◽  
Pehr E. Pehrsson

2015 ◽  
Vol 162 (10) ◽  
pp. B264-B268 ◽  
Author(s):  
Che-Wei Hsu ◽  
Wen-Chao Feng ◽  
Fang-Ci Su ◽  
Gou-Jen Wang

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