Fine Structures of the X-Ray Absorption Spectra for Thin Films of Metallic Coppers

1970 ◽  
Vol 9 (11) ◽  
pp. 1372-1377
Author(s):  
Hayao Kubo ◽  
Hiroo Nakamori ◽  
Kenjiro Tsutsumi
2009 ◽  
Vol 476 (4-6) ◽  
pp. 147-150 ◽  
Author(s):  
Yasen Velkov ◽  
Victor Kimberg ◽  
Nobuhiro Kosugi ◽  
Paweł Sałek ◽  
Faris Gel’mukhanov

2013 ◽  
Vol 265 ◽  
pp. 358-362 ◽  
Author(s):  
W. Cao ◽  
M. Masnadi ◽  
S. Eger ◽  
M. Martinson ◽  
Q.-F. Xiao ◽  
...  

1998 ◽  
Vol 524 ◽  
Author(s):  
S. J. Naftel ◽  
I Coulthard ◽  
Y. Hu ◽  
T. K. Sham ◽  
M. Zinke-Allmang

ABSTRACTCobalt silicide thin films, prepared on Si(100) wafers, have been studied by X-ray absorption near edge structures (XANES) at the Si K-, L2,3 and Co K-edges utilizing both total electron (TEY) and fluorescence yield (FLY) detection as well as extended X-ray absorption fine structure (EXAFS) at the Co K-edge. Samples made using DC sputter deposition on clean Si surfaces and MBE were studied along with a bulk CoSi2 sample. XANES and EXAFS provide information about the electronic structure and morphology of the films. It was found that the films studied have essentially the same structure as bulk CoSi2. Both the spectroscopy and materials characterization aspects of XAFS (X-ray absorption fine structures) are discussed.


2017 ◽  
Author(s):  
Madhusmita Sahoo ◽  
Ashok Kumar Yadav ◽  
S. N. Jha ◽  
Dibyendu Bhattacharyya ◽  
Tom Mathews ◽  
...  

2005 ◽  
Vol 123 (4) ◽  
pp. 044509 ◽  
Author(s):  
A. Schoell ◽  
Y. Zou ◽  
D. Huebner ◽  
S. G. Urquhart ◽  
Th. Schmidt ◽  
...  

2007 ◽  
Vol 156-158 ◽  
pp. 303-306 ◽  
Author(s):  
A. Kikas ◽  
J. Aarik ◽  
V. Kisand ◽  
K. Kooser ◽  
T. Käämbre ◽  
...  

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