Characterization of the Chemical‐Mechanical Polishing Process Based on Nanoindentation Measurement of Dielectric Films

1995 ◽  
Vol 142 (9) ◽  
pp. 3098-3104 ◽  
Author(s):  
Chi‐Wen Liu ◽  
Bau‐Tong Dai ◽  
Ching‐Fa Yeh
2018 ◽  
Vol 548 ◽  
pp. 232-238 ◽  
Author(s):  
Nur Fatin Amalina Muhammad Sanusi ◽  
Mohd Hizami Mohd Yusoff ◽  
Ooi Boon Seng ◽  
Mohd Sabirin Marzuki ◽  
Ahmad Zuhairi Abdullah

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