Charge Trapping and Interface State Generation by Avalanche Hot‐Electron Injection in Rapid Thermal  NH 3 Annealed and Reoxidized SiO2 Films

1990 ◽  
Vol 137 (6) ◽  
pp. 1871-1876 ◽  
Author(s):  
Z. H. Liu ◽  
P. S. Chen ◽  
Y. C. Cheng ◽  
P. T. Lai
Keyword(s):  
Charge Trapping ◽  
Electron Injection ◽  
Interface State ◽  
Hot Electron ◽  
Sio2 Films ◽  
Hot Electron Injection ◽  
State Generation

Interface State Generation Mechanism in MOSFET's during Substrate Hot-Electron Injection

1988 ◽  
Vol 27 (Part 2, No. 12) ◽  
pp. L2395-L2397 ◽  
Author(s):  
Naoki Yasuda ◽  
Hiroshi Nakamura ◽  
Kenji Taniguchi ◽  
Chihiro Hamaguchi ◽  
Masakazu Kakumu
Keyword(s):  
Electron Injection ◽  
Interface State ◽  
Generation Mechanism ◽  
Hot Electron ◽  
Hot Electron Injection ◽  
State Generation

Measurements of Hydrogen Redistribution in Hot Electron Injection of Mos Capacitors

1992 ◽  
Vol 284 ◽  
Author(s):  
A. D. Marwick ◽  
D. A. Buchanan ◽  
D. J. Dimaria ◽  
Phil Saunders
Keyword(s):  
Nuclear Reaction ◽  
Depth Profiling ◽  
Electron Injection ◽  
Interface State ◽  
Hot Electron ◽  
Mos Capacitors ◽  
Hot Electron Injection ◽  
State Generation ◽  
Large Peak ◽  
Redistribution Of Hydrogen

ABSTRACTRedistribution of hydrogen caused by hot electron injection has been studied in large Al-gate capacitors using internal photemission followed by hydrogen depth profiling with the 15 N nuclear reaction. A large peak of hydrogen (∼ 1015 at /cm2) at the Al/SiO2 interface due to a hydrated layer on the surface of the SiO2 was found to act as a source of hydrogen during the photoinjection. A small fraction of the hydrogen released from this peak was found to be re-trapped near the Si/;SiO2 interface if a field of >1 MV/cm was applied to the SiO2 during the injection. Up to 2 × 1014 atoms/cm2 of hydrogen were found to be trapped at this interface for injected fluences up to 5 C/cm2. These results are discussed in terms of current models of interface state generation involving hydrogen.

Investigation of Channel Hot Electron Injection by Localized Charge-Trapping Nonvolatile Memory Devices

2004 ◽  
Vol 51 (3) ◽  
pp. 444-451 ◽  
Author(s):  
E. Lusky ◽  
Y. Shacham-Diamand ◽  
G. Mitenberg ◽  
A. Shappir ◽  
I. Bloom ◽  
...  
Keyword(s):  
Nonvolatile Memory ◽  
Charge Trapping ◽  
Electron Injection ◽  
Memory Devices ◽  
Hot Electron ◽  
Hot Electron Injection ◽  
Nonvolatile Memory Devices

Rectification in Chiral Carbon Nanotubes with Hot Electron Injection

2020 ◽  
Vol 131 (3) ◽  
pp. 456-459
Author(s):  
S. S. Abukari ◽  
R. Musah ◽  
M. Amekpewu ◽  
S. Y. Mensah ◽  
N. G. Mensah ◽  
...  
Keyword(s):  
Carbon Nanotubes ◽  
Electron Injection ◽  
Hot Electron ◽  
Hot Electron Injection ◽  
Chiral Carbon
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