Enhanced Thermoelectric Properties of Skutterudite Thick Film Polyvinyl Alcohol Assisted from the Post-Deposition Annealing Effect

2021 ◽  
Author(s):  
Nuur Syahidah Sabran ◽  
Iman Aris Fadzallah ◽  
MOHD FAIZUL MOHD SABRI ◽  
Ono Takahito ◽  
Khairul Fadzli Samat ◽  
...  
Keyword(s):  
Polyvinyl Alcohol ◽  
Thick Film ◽  
Thermoelectric Properties ◽  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Post Deposition

scholarly journals The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films

RSC Advances ◽  
2020 ◽  
Vol 10 (49) ◽  
pp. 29394-29401
Author(s):  
Chandrasekaran Abinaya ◽  
Kevin Bethke ◽  
Virgil Andrei ◽  
Jonas Baumann ◽  
Beatrix Pollakowski-Herrmann ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Oxide ◽  
Thermoelectric Properties ◽  
Oxide Films ◽  
Thermoelectric Performance ◽  
Annealing Atmosphere ◽  
Oxide Thin Films ◽  
Post Deposition Annealing ◽  
Annealing Conditions ◽  
Post Deposition

This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.

Post deposition annealing effect on the electrical properties of β-Ga2O3 Nanowire

2020 ◽  
Vol 31 (22) ◽  
pp. 20378-20386
Author(s):  
Shagolsem Romeo Meitei ◽  
Rajshree Rajkumari ◽  
Naorem Khelchand Singh
Keyword(s):  
Electrical Properties ◽  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Post Deposition

Post-deposition annealing effect on In2S3 thin films deposited using SILAR technique

2007 ◽  
Vol 10 (1) ◽  
pp. 49-55 ◽  
Author(s):  
R. Ranjith ◽  
Teny Theresa John ◽  
C. Sudha Kartha ◽  
K.P. Vijayakumar ◽  
T. Abe ◽  
...  
Keyword(s):  
Thin Films ◽  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Silar Technique ◽  
Post Deposition

Post-deposition annealing effect on RF-sputtered TiO2 thin-film properties for photonic applications

2016 ◽  
Vol 122 (2) ◽  
Author(s):  
Ilhem Hadjoub ◽  
Tahar Touam ◽  
Azeddine Chelouche ◽  
Mohamed Atoui ◽  
Jeanne Solard ◽  
...  
Keyword(s):  
Thin Film ◽  
Tio2 Thin Film ◽  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Film Properties ◽  
Post Deposition

scholarly journals Post deposition annealing effect on the properties of Al2O3/InP interface

AIP Advances ◽  
2018 ◽  
Vol 8 (2) ◽  
pp. 025211
Author(s):  
Hogyoung Kim ◽  
Dong Ha Kim ◽  
Byung Joon Choi
Keyword(s):  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Post Deposition

EFFECT OF POST-DEPOSITION ANNEALING IN FORMING GAS ON STRUCTURAL AND ELECTRICAL PROPERTIES OF SOL–GEL DERIVED SiO2 THICK FILM ON 4H–SiC

2010 ◽  
Vol 24 (23) ◽  
pp. 4521-4528
Author(s):  
KUAN YEW CHEONG ◽  
AZLAN AHMAD KURNIN
Keyword(s):  
Electrical Properties ◽  
Thick Film ◽  
Substrate Surface ◽  
Sol Gel ◽  
Film Deposition ◽  
Post Deposition Annealing ◽  
Structural And Electrical Properties ◽  
Coated Film ◽  
Post Deposition ◽  
Deposition Substrate

The effect of post-deposition annealing in forming gas on the structural and electrical properties of sol–gel derived SiO 2 thick film on n-type 4H–SiC has been systematically investigated. Tetraethylorthosilicate-based precursor with H 2 SO 4 as catalyst was prepared and prior to film deposition, substrate surface was treated by hexamethyldisilizane. The spin-coated film was annealed at 750–950°C for 30 min with an approximately 185-nm thick film. It was found that oxide annealed at the highest temperature revealed the densest film, lowest oxide defects, and lowest total interface trap density. As a result, this oxide had demonstrated the lowest leakage current density if compared with other oxides.

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