Post-deposition-annealing effect on current conduction in Al2O3films formed by atomic layer deposition with H2O oxidant

2017 ◽  
Vol 121 (7) ◽  
pp. 074502 ◽  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Annealing Effect ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Current Conduction ◽  
Post Deposition

Effects of Post-Deposition Annealing on the Electrical Properties of HfSiO Films Grown by Atomic Layer Deposition

2005 ◽  
Vol 44 (4B) ◽  
pp. 2230-2234 ◽  
Author(s):  
Hag-Ju Cho ◽  
Hye Lan Lee ◽  
Hong Bae Park ◽  
Taek Soo Jeon ◽  
Seong Geon Park ◽  
...  
Keyword(s):  
Electrical Properties ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Atomic layer deposition and post-deposition annealing of PbTiO3 thin films

2006 ◽  
Vol 496 (2) ◽  
pp. 346-352 ◽  
Author(s):  
Jenni Harjuoja ◽  
Anne Kosola ◽  
Matti Putkonen ◽  
Lauri Niinistö
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Manganese oxide films with controlled oxidation state for water splitting devices through a combination of atomic layer deposition and post-deposition annealing

RSC Advances ◽  
2016 ◽  
Vol 6 (100) ◽  
pp. 98337-98343 ◽  
Author(s):  
Felix Mattelaer ◽  
Tom Bosserez ◽  
Jan Rongé ◽  
Johan A. Martens ◽  
Jolien Dendooven ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atomic Layer Deposition ◽  
Manganese Oxide ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Solar Hydrogen ◽  
Layer Deposition ◽  
Thin Film Catalysts ◽  
Post Deposition

Manganese oxide thin films were obtained by a combination of atomic layer deposition and post-deposition annealing, and the viability of these thin films as thin film catalysts for solar hydrogen devices has been demonstrated.

scholarly journals Impact of post-deposition annealing on interfacial chemical bonding states between AlGaN and ZrO2 grown by atomic layer deposition

2015 ◽  
Vol 106 (9) ◽  
pp. 091603 ◽  
Author(s):  
Gang Ye ◽  
Hong Wang ◽  
Serene Lay Geok Ng ◽  
Rong Ji ◽  
Subramaniam Arulkumaran ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Bonding ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Densification of silicon dioxide formed by plasma-enhanced atomic layer deposition on 4H-silicon carbide using argon post-deposition annealing

2018 ◽  
Vol 44 (12) ◽  
pp. 13565-13571 ◽  
Author(s):  
Suhyeong Lee ◽  
Ji Min Kim ◽  
Changhyun Kim ◽  
Hyunwoo Kim ◽  
Hong Jeon Kang ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Atomic Layer Deposition ◽  
Silicon Dioxide ◽  
Atomic Layer ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Post Deposition

Kinetics of anatase phase formation in TiO2 films during atomic layer deposition and post-deposition annealing

CrystEngComm ◽  
2013 ◽  
Vol 15 (46) ◽  
pp. 9949 ◽  
Author(s):  
Grzegorz Luka ◽  
Bartlomiej S. Witkowski ◽  
Lukasz Wachnicki ◽  
Mariusz Andrzejczuk ◽  
Malgorzata Lewandowska ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Phase Formation ◽  
Anatase Phase ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Post Deposition Annealing ◽  
Layer Deposition ◽  
Kinetics Of ◽  
Post Deposition
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