Silicon Nitride Thickness Dependent Electrical Properties of InAlN/GaN Heterostructures

ECS Meeting Abstracts ◽

10.1149/ma2014-01/41/1531 ◽

2014 ◽

Keyword(s):

Silicon Nitride ◽

Electrical Properties

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Improvement of the electrical properties of polyimide films with silicon nitride nanoparticles

2017 IEEE 12th Nanotechnology Materials and Devices Conference (NMDC) ◽

10.1109/nmdc.2017.8350503 ◽

2017 ◽

Author(s):

Sombel Diaham ◽

Francois Saysouk ◽

Marie-Laure Locatelli

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Polyimide Films

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Deposition and Electrical Properties of Silicon Nitride Thin Film MIM Capacitors for MMIC Applications

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2004.17.3.283 ◽

2004 ◽

Vol 17 (3) ◽

pp. 283-288

Keyword(s):

Thin Film ◽

Silicon Nitride ◽

Electrical Properties ◽

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Effect of plasma treatment on the microstructure and electrical properties of MIM capacitors with PECVD silicon oxide and silicon nitride

Journal of Materials Science ◽

10.1007/s10853-006-0012-0 ◽

2007 ◽

Vol 42 (3) ◽

pp. 941-947 ◽

Author(s):

Chia-Cheng Ho ◽

Bi-Shiou Chiou

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Plasma Treatment ◽

Silicon Oxide ◽

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Electrical properties in silicon oxynitride and silicon nitride prepared by plasma-enhanced chemical vapor deposition

Proceedings of 2001 International Symposium on Electrical Insulating Materials (ISEIM 2001). 2001 Asian Conference on Electrical Insulating Diagnosis (ACEID 2001). 33rd Symposium on Electrical and Electronic Insulating Materials and Applications in System ◽

10.1109/iseim.2001.973591 ◽

2002 ◽

Author(s):

H. Sato ◽

H. Kato ◽

Y. Ohki ◽

Kwang Soo Seol ◽

T. Noma

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride

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Composition, structural, and electrical properties of fluorinated silicon–nitride thin films grown by remote plasma-enhanced chemical-vapor deposition from SiF[sub 4]/NH[sub 3] mixtures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1699335 ◽

2004 ◽

Vol 22 (3) ◽

pp. 570 ◽

Author(s):

J. Fandiño ◽

A. Ortiz ◽

L. Rodrı́guez-Fernandez ◽

J. C. Alonso

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Structural And Electrical Properties

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Electrical properties of silicon nitride films plasma‐deposited from SiF4, N2, and H2 source gases

Journal of Applied Physics ◽

10.1063/1.334768 ◽

1985 ◽

Vol 57 (2) ◽

pp. 426-431 ◽

Author(s):

Shizuo Fujita ◽

Toshiyuki Ohishi ◽

Hideo Toyoshima ◽

Akio Sasaki

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Silicon Nitride Films

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Electrical Properties of Metal–Silicon Nitride–Hydrogenated Amorphous Silicon Capacitor Elucidated Using Admittance Spectroscopy

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.8714 ◽

2008 ◽

Vol 47 (12) ◽

pp. 8714-8718 ◽

Author(s):

Ming-Ta Hsieh ◽

Jenn-Fang Chen ◽

Kuo-Hsi Yen ◽

Hsiao-Wen Zan ◽

Chan-Ching Chang ◽

...

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Admittance Spectroscopy ◽

Hydrogenated Amorphous

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ChemInform Abstract: ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE FILMS MEASURED IN STRONG ELECTRIC FIELDS

Chemischer Informationsdienst ◽

10.1002/chin.197340027 ◽

1973 ◽

Vol 4 (40) ◽

pp. no-no

Author(s):

P. K. CHAUDHARI ◽

J. M. FRANZ ◽

C. P. ACKER

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Electric Fields ◽

Silicon Nitride Films ◽

Strong Electric Fields

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ChemInform Abstract: Mechanical and Electrical Properties of Silicon Nitride-Silicon Carbide Nanocomposite Material.

10.1002/chin.199132007 ◽

2010 ◽

Vol 22 (32) ◽

pp. no-no ◽

Author(s):

A. SAWAGUCHI ◽

K. TODA ◽

K. NIIHARA

Keyword(s):

Silicon Carbide ◽

Silicon Nitride ◽

Electrical Properties ◽

Nanocomposite Material ◽

Mechanical And Electrical Properties

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Optical and Electrical Properties of Hydrogenated Amorphous Silicon Nitride Films Deposited in Various PECVD systems

MRS Proceedings ◽

10.1557/proc-68-175 ◽

1986 ◽

Vol 68 ◽

Author(s):

Nancy Voke ◽

Jerzy Kanicki

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Optical And Electrical Properties ◽

Amorphous Silicon Nitride ◽

Full Characterization ◽

Silicon Nitride Films ◽

Hydrogenated Amorphous

Hydrogenated amorphous silicon nitride films, prepared in various commercially available plasma enhanced chemical vapor deposition systems, have been investigated in terms of different deposition conditions.The full characterization of these gate insulators has been carried out by different techniques.Experimental data and interesting findings obtained from this study are presented.Special attention has been devoted to the influence of hydrogen on optical and electrical properties.

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